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Posted: June 9, 2008
Nanometrics Announces IMPULSE Integrated Metrology System
(Nanowerk News) Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced process control metrology equipment, today announced the introduction of its latest integrated metrology (IM) system, IMPULSE™.
Following the innovative 9000 and 9010 IM systems, the Nanometrics IMPULSE is a 300mm, real-time metrology system used to monitor vital CMP, CVD, etch, and photolithography process applications for 32nm nodes and beyond. The system combines the industry’s most advanced technology and best cost of ownership for thin film and optical critical dimension (OCD) metrology in an IM platform.
The IMPULSE incorporates new innovations in mechano-optical design and algorithms, allowing up to 70% higher throughput over previous generation systems and three times tighter process control windows. These inherent system advancements will allow device makers to achieve better process control for greater yield and device performance.
Leveraging 35 years of R&D in metrology and over 1,000 IM systems shipped, Nanometrics continues to build on its experience to offer innovative and reliable IM solutions to semiconductor fabs worldwide. “Our new IMPULSE IM system will enable customers to reach their 32nm process window targets without sacrificing process tool productivity,” commented Steve Bradley, Director of the Integrated Metrology Business Unit at Nanometrics. “This will improve yield, performance, and enable a significant cost of ownership advantage over current systems.”
The IMPULSE IM module also provides plug and play connectivity with Nanometrics’ high-end Atlas XP standalone metrology systems through its NanoNet connectivity solution, and along with its compact footprint and modular design, IMPULSE enables easy implementation for new customers and seamless upgradeability for existing customers. When combined with Nanometrics’ NanoCD Suite, IMPULSE enables the most advanced CD metrology in an IM system. With the addition of the IMPULSE, Nanometrics advances its strategy and commitment to offer comprehensive process control metrology solutions in every segment within today’s advanced semiconductor manufacturing factories.
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used in semiconductor manufacturing. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control and optical, electrical and material properties, including the structural composition of silicon and compound semiconductor devices, during various steps of the manufacturing process. These systems enable semiconductor manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on the NASDAQ Global Market under the symbol NANO. Nanometrics’ website is http://www.nanometrics.com.