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Posted: October 7, 2008
Large Area Nanoimprint Lithography now Available on SUSS Mask Aligners
(Nanowerk News) SUSS MicroTec, a supplier of innovative solutions for the 3D, MEMS, Advanced Packaging and Nanotechnology markets, announced today that the capabilities of its manual mask aligners are now enhanced with a new nanoimprint toolkit, that enables them to pattern large areas with repeatable sub-50 nm printing capability. The new technology called SCIL (Substrate Conformal Imprint Lithography) has been developed by Philips Research, Eindhoven/The Netherlands and transferred to SUSS MicroTec in a technology license agreement.
SCIL is bridging the gap between small rigid stamp NIL (nano imprint lithography) application for best resolution and large-area soft stamp usage with usually limited printing resolution below 200 nm. Its excellent performance in terms of substrate conformity and pattern fidelity over large areas makes this imprint technology a powerful tool, especially for applications like high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) to use in next-generation hard disc drives.
The SCIL toolkit can be field-installed on any SUSS MA6/8 Mask Aligner with very limited effort. MiPlaza, the open innovation center located at the High Tech Campus Eindhoven, is also looking into specific process requirements, MiPlaza (Microsystems Plaza), part of Philips Research, offers world-class expertise, service and infrastructure to high-tech organizations inside and outside Philips. MiPlaza is investigating further process development in the field of substrate conformal imprint lithography.
“This cooperation with Philips Research and MiPlaza demonstrates SUSS Micro Tec’s continued commitment to bringing the most innovative technology to the marketplace,” said Rolf Wolf, general manager of SUSS MicroTec’s lithography division. “SCIL represents an enabling and revolutionary approach to large-area nanoimprint applications.”