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Posted: November 12, 2008
Fujitsu Microelectronics Provides Advanced 65nm RF CMOS Process Design Kit
(Nanowerk News) Fujitsu Microelectronics America,
Inc. (FMA) today announced the availability of 65nm RF CMOS manufacturing
services with the introduction of an advanced Process Design Kit (PDK) to
enable first-pass silicon success. The RF CMOS platforms from Fujitsu are now
available to customers in 90nm and 65nm nodes.
The RF CMOS PDKs are ideal for developing high-performance, low-power
SoCs that integrate RF functions for Bluetooth, GPS, cellular, wireless
audio/video, wireless LAN and optical communications. The highly accurate
transistor models include both advanced PSP and traditional BSIM models. The
PDK's superior model accuracy and improved ease of use enable engineers to
design challenging mixed-signal and RF ICs easily.
Based on the Fujitsu low leakage 90nm and 65nm analog/RF CMOS process
technologies, the PDKs include a comprehensive set of parameterized cells and
toolkits for active and passive devices. The flexible inductor synthesis
toolkit automatically generates precise and scalable inductor layout and
models for high-speed analog and RF circuits. The sophisticated statistical
simulation environment is a powerful tool for yield analysis, process
sensitivity and design space exploration. The result for customers is reduced
development time and rapid time-to-market.
"Our platforms ensure that our customers achieve first-pass functional
silicon at the 90- and 65-nanometer process nodes for high-performance,
low-power RF CMOS IC designs, avoiding costly re-spins and low yields," said
Steve Della Rocchetta, vice president of the Semiconductor Manufacturing
Services business group at Fujitsu Microelectronics America.
"The main advantage of the Fujitsu RF CMOS processes is the ability to
integrate complex logic, analog and RF circuits into single chip," said
Tatsuya Yamazaki, vice president, in charge of the ASIC/COT business for
Fujitsu Microelectronics Limited in Japan. "Built on the Fujitsu advanced
process technologies, accurate device models, and comprehensive IP portfolios,
the Fujitsu low-power RF CMOS technology platforms are exceptional choices for
next-generation, high-volume wireless applications."
Both the 90nm CS100A-LL and 65nm CS200L PDKs are available now. Customers
are using the design kits for their leading-edge, high-precision analog and
high-speed RF applications.
Fujitsu has issued a new white paper entitled "Motivation for RF
Integration," which discusses the many opportunities for the semiconductor
industry that have been created by the proliferation of wireless applications,
ranging from cellular phones to wireless audio/video products. Although major
components in traditional wireless systems have long been fabricated in a
variety of CMOS and compound semiconductor process technologies, recent
advances in RF CMOS have made it the technology of choice for these
applications. RF CMOS is contributing significantly to the success of wireless
products in the marketplace. The new white paper is available at
About Fujitsu Microelectronics America, Inc.
Fujitsu Microelectronics America, Inc. (FMA) leads the industry in
innovation. FMA provides high-quality, reliable semiconductor products, design
and manufacturing services for the wireless, networking, consumer, automotive,
and other markets throughout North and South America. For product information,
visit the company web site at http://us.fujitsu.com/micro/wafer or e-mail
The Fujitsu RF CMOS PDKs for 65nm/90nm process fact sheet.
The Fujitsu RF CMOS whitepaper; "Motivation for RF Integration"