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Posted: December 12, 2008
New international program on maskless lithography for 22 nanometer IC manufacturing
(Nanowerk News) MAPPER Lithography and CEA-Leti, a leading French semiconductor research institution, signed an agreement today according to which MAPPER will ship a 300 mm electron-beam direct write lithography platform to CEA-Leti in Grenoble. The machine will be used for a new industrial program called IMAGINE in which IC companies will assess MAPPER’s technology to develop maskless lithography for IC manufacturing.
“This is a great opportunity for MAPPER”, said MAPPER’s CEO, Dr. Christopher Hegarty. “By shipping this machine to CEA-Leti and executing an industry-wide development program in the coming three years, MAPPER will have the opportunity to verify the applicability of our technology with a number of different companies. CEA-Leti’s expertise in electron beam technology makes them the ideal partner for us to integrate our technology into the production infrastructure and make it production ready. This allows companies involved in resist and data processing technologies to develop the infrastructure required to be ready for 22 nm.”
Taking maskless lithography to the next step
Dr. Laurent Mallier, CEO of CEA-Leti states: “CEA-Leti’s extensive experience in electron beam technology for IC manufacturing and MAPPER’s technology are a perfect fit to host an international program at CEA-Leti. We have been working very successfully with MAPPER in the European MAGIC program. Having this machine at our site will enable us to take maskless lithography to the next step in the development that is required to make it a viable solution for 22 nm manufacturing.”
The IMAGINE program will cover a range of topics, including tool assessment, patterning and process integration, data handling and cost of ownership studies. CEA-Leti and MAPPER are currently in the process of selecting semiconductor companies to join the program.