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Posted: December 13, 2008

Chinese University Selects Heidelberg Instruments for Aadvanced Maskless Laser Lithography System

(Nanowerk News) Heidelberg Instruments announced the sale of an advanced DWL 66FS maskless laser lithography system to the Zhejiang Normal University, located in Jinhau, China. System will be used in fabrication of Micro Optical Electro Mechanical Devices, as well as photomask production.
The DWL 66FS maskless lithography system will be capable of binary and grey scale exposure, layer to layer alignment, and will be able to produce minimum features down to 0.6 microns.
About Heidelberg Instruments, GmbH
With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.
Source: Heidelberg Instruments (press release)
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