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Posted: January 12, 2009

Ferdinand-Braun-Institut Orders Vistec's Variable Shaped Beam Lithography System

(Nanowerk News) The Ferdinand-Braun-Institute explores cutting-edge technologies for innovative applications in the field of microwaves and optoelectronics in close co-operation with the industry. The spectrum of work ranges from basic research projects to devices delivered as demonstrators or pilot series to industrial partners.
Installed in the existing process line, the new electron-beam lithography system is required for the development of state-of-the-art electronic and opto-electronic high-power devices based on GaAs and GaN. Additionally, the Vistec SB250 will be used as an in-house mask writer. “The investment is vital for FBH in order to remain competitive. The system’s performance as demonstrated in a series of tests meets our demands and will provide a solid basis for future research and development of high-value products and services.” says Dr. Krueger, Head of Process Technology Department.
The Vistec SB250 Series was designed as a universal and cost-effective electron-beam lithography system for both direct write and mask making applications. The SB250 as a Variable Shaped Beam system operating at 50kV, is capable to deal with a high variety of substrates (both in terms of types and dimensions) using a maximum stage travel range of 210mm x 210mm in fully automated operation. Excellent lithography performance combined with a high throughput opens possibilities for a wide range of applications.
“We are very glad to continue our long standing partnership with the Ferdinand-Braun-Institute. Vistec is looking forward to contributing with this new, highly flexible lithography system to FBH’s strategy to bridge the gap between research and application”, stated Wolfgang Dorl, General Manager of Vistec Electron Beam.
Source: Vistec (press release)
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