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Posted: February 5, 2009

Chalmers University of Technology Orders AIXTRON Nanotube System

(Nanowerk News) AIXTRON AG announced the order of a 2-inch AIXTRON R&D CNT system from the Chalmers University of Technology, Sweden received in the fourth quarter of 2008. This combined thermal CVD and plasma enhanced CVD tool is planned to be delivered in first quarter 2009 and will be used for the deposition of CNT for micro-coolers, through silicon vias (TSV), sensors on CMOS and other nanotechnology based components.
Prof. Johan Liu, Chalmers University of Technology comments: “Our micro-cooler, TSV, sensor and electronics applications require well controlled vertically aligned CNT and AIXTRON’s CNT system is optimized exactly for this. AIXTRON has a proven track record with its R&D CNT platform, which has not only demonstrated reproducibility and reliability in the field, but also flexibility for new process development.”
AIXTRON is a world leading supplier of Chemical Vapour Deposition (CVD), Atomic Vapor Deposition (AVD®) and Atomic Layer Deposition (ALD) equipment to the semiconductor industry, with over 1,500 systems delivered to date. AIXTRON-Nanoinstruments is focused on serving the Nanotechnology market through the manufacture of plasma enhanced CVD systems for carbon nanotubes (CNT) and other nanomaterials.
AIXTRON’s nanotube and nanowire track record includes customers such as El-Mul Technologies, Harvard University, Kansas State University, Massachusetts Institute of Technology, Nanoconduction, Portland State University, Singapore Polytechnic, Santa Clara University, UC San Diego, University of Tuebingen, and Yale University.
Source: Aixtron (press release)
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