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Posted: February 17, 2009

NIL Technology Announces Launch of Nickel Standard Stamps with Antireflective Structures

(Nanowerk News) Antireflective structures are surface-relief structures with dimensions smaller than the wavelengths of visible light, also called sub-wavelength structures, reducing the reflection of light from a surface (interface between to different materials). The antireflective structures on the new standard stamps are graded index profile structures. They reduce the reflectivity of an interface between air (refractive index 1) and PMMA (refractive index 1.5) to below 1%.
“This is the first of our standard stamps having an application-specific profile. It is an initiative to meet the growing demand for nanostructures within the display and solar cell industry-sectors, and to further support and disseminate the unique benefits of nanoimprint lithography over other emergent nanolithography technologies”, Theodor Nielsen, CEO, states.
The new antireflective standard stamps are delivered in Nickel within 3 weeks from ordering. Three different standard stamps are offered. Two stamps of different size with standard antireflective structures and one stamp with high performance antireflective structures. Learn more at
About NIL Technology ApS
NIL Technology is a nanotechnology company located in Copenghagen, Denmark. NIL Technology is engaged in the fabrication of stamps for nanoimprint lithography (NIL), nanoimprint processing and electron beam lithography. NIL is a disruptive lithography technology listed on the International Technology Roadmap for Semiconductors (ITRS) as a lithography candidate for the 32 nm node and beyond. Our corporate objective is to become the leading supplier of nanoimprint lithography stamps. NIL Technology has unique competencies within nanoimprint lithography, nanoimprint lithography stamp production and electron beam lithography.
Source: NIL Technologies (press release)
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