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Posted: March 23, 2009

Vistec Receives Major Electron Beam Lithography System Order From Helmholtz-Zentrum

(Nanowerk News) Vistec Lithography Inc., a global supplier of electron-beam lithography systems, announced that they have received a major order from Helmholtz-Zentrum Berlin in Berlin-Adlershof for one of its Vistec EBPG5000plus electron-beam lithography systems.
The Helmholtz-Zentrum Berlin and Vistec Lithography Inc. will work together on further enhance the Gaussian Beam system to fulfil the challenging requirements for generating advanced diffractive optics required for the X-ray imaging activities at BESSY II, the only German 3rd generation synchrotron radiation facility.
BESSY II is now operated by the new Helmholtz-Zentrum Berlin für Materialien und Energie GmbH (HZB), which has been formed by the merger of the Hahn-Meitner-Institut Berlin (HMI) and BESSY. Beside other synchrotron applications Helmholtz-Zentrum Berlin pursues on high-resolution X-ray microscopy.
Fresnel zone plates are the key elements for high resolution X-ray microscopy. The achievable resolution of an X-ray microscope depends strongly on the optical performance of the Fresnel lenses. This is where the new electron-beam lithography system comes into play. The Vistec EBPG5000plusES is used for patterning Fresnel zone plates with a minimum zone width below 20 nm, in combination with superb placement and overlay figures. It is worth saying that the system can also be used for more standard e-beam lithography applications.
"The EBPG5000plusES combines both excellent resolution and the highest accuracy, which allows us to pattern the most enhanced Fresnel optics for soft and hard X-rays. With the new e-beam lithography system, we expect to develop stacked zone plates with unique performance in spatial resolution and efficiency for the soft and hard X-ray photon energy range", said Dr. Gerd Schneider, Head of the X-ray microscopy activities at the Helmholtz-Zentrum Berlin.
The order from HZB is in line with other Vistec electron-beam lithography systems currently installed at leading edge research institutes worldwide. Based on reliable and well-proven system architecture, the Vistec EBPG5000plusES system provides a spot size down to 2.2nm at 100keV beam energy, thus allowing nano-lithography structures smaller than 8nm to be routinely generated. As a result of its high flexibility and easyto-use software, the EBPG5000plusES has become the "system of choice" in the research community. "We are very pleased to have received this order from the Helmholtz-Zentrum Berlin für Materialien und Energie GmbH. We are looking forward to contributing to the success of our customers challenging projects with our electron-beam technology", says Rainer Schmid, General Manager at Vistec Lithography Inc.
Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography. Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA), within the Capital Region of New York. Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).
Source: Vistec Lithography (press release)