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Posted: March 26, 2009
Heidelberg Instruments to Support Micro and Nano Research at the MESA+ Institute for Nanotechnology
(Nanowerk News) Heidelberg Instruments announced the sale of an advanced DWL 2000 maskless laser lithography system, with an automatic photomask handling system, to the MESA+ Institute for Nanotechnology, at the University of Twente, The Netherlands.
The DWL 2000 system will enable the user to expose sub micron structures on photoresist, with an active write area of up to 200 mm by 200 mm.
“MESA+ is one of the largest nanotechnology research institutes in the world, delivering competitive and successful high quality research. MESA+, Institute for Nanotechnology, is part of the University of Twente, having intensive cooperation with various research groups within the University. The University Twente is re-allocating the buildings for research and education. In the centre of these buildings the new NanoLab will be build. This NanoLab contains 1000 m2 cleanroom. NanoLab is the new research facility of the MESA+ institute for NanoTechnology.
With the investment in NanoLab the university shows the interest for and the importance of Nanotechnology research. The NanoLab will be built –next to cleanliness, temperature and humidity control- with special floor constructions so there will be no vibration interference. In order to support the research groups and start-up companies the DWL2000 will be installed for research and device-prototyping.” States Mr. Peter Linders, Faculty of EEMCS, MESA+ Institute for Nanotechnology
About Heidelberg Instruments, GmbH: With an installation base in over 30 countries, Heidelberg Instruments is a world leader in production of high precision maskless lithography systems. These systems are used for direct writing and photomask production by some of the most prestigious universities and industry leaders in the areas of MEMS, BioMEMS, Nano Technology, ASICS, TFT, Plasma Displays, Micro Optics, and many other related applications.