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Posted: Jun 20, 2012
Picosun Launches New Source System for Extremely Low Vapor Pressure and Heat Sensitive ALD Precursors
(Nanowerk News) Picosun Oy, Finland-based, globally operating manufacturer of state-of-the-art Atomic Layer Deposition (ALD) systems, has launched its new heated and boosted source system called Picohot™ 300.
Picohot™ 300 has been designed specifically for PICOSUN™ P-series production-scale ALD systems. It has very large surface area for precursor vaporization, two computer-controlled three-way pneumatic valves for pulsing and it can reach the maximum temperature of 300 oC. Temperature-controlled conduits finalize efficient vaporization and delivery of the precursor. The maximum volume of precursor that can be filled into the source is 300 ml, which ensures extended operation times of the ALD tool without the need to stop the process for re-filling the precursor source vessel.
Very good deposition results have been obtained with the Picohot™ 300 source system in batch processes. For example, for tantalum oxide batch process (with tantalum (I) ethoxide and water as precursors) within-wafer 1? non-uniformity of 3.2 % and wafer-to-wafer 1? non-uniformity of 3.9 % have been obtained.
“Efficient precursor delivery systems are crucial for reliable, repeatable, high throughput industrial quality ALD processes. There are several ALD precursors that are very heat sensitive and need evaporation at as low temperatures as possible to avoid undesired side reactions such as decomposition, polymerization or condensation between the precursor molecules. Picohot™ 300 is designed to overcome the challenges with precursors of extremely low volatility and/or temperature sensitivity. We are happy to introduce the product to our customers in the most important ALD event of the year, the international ALD conference taking place at the moment in the heart of Europe’s IC manufacturing industry, in Dresden, Germany,” states Juhana Kostamo, Managing Director of Picosun.
Picosun Oy is Finnish, world-wide operating manufacturer of state-of-the-art ALD systems, representing continuity to almost four decades of pioneering, exclusive ALD reactor design and manufacturing. Picosun’s global headquarters are located in Espoo, Finland, its production facilities in Kirkkonummi, Finland, its US headquarters in Detroit, Michigan, and its Asian headquarters in Singapore. Today, PICOSUN™ ALD tools are in continuous production and R&D use in numerous frontline industries and research organizations across four continents.
Source: Picosun (press release)
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