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Posted: Jun 27, 2012

Cambridge NanoTech Enters Licensing Agreement With Ghent University: Announcing Atomic Layer Deposition for Particle Coatings

(Nanowerk News) Cambridge NanoTech, the world leader in Atomic Layer Deposition (ALD) science and equipment announced today that it has entered a licensing agreement with Ghent University to commercialize an ALD particle coating technology. Cambridge NanoTech will expand on their current product portfolio of research and manufacturing ALD systems and develop the Cyprus™ system, a product dedicated to ALD coatings of particles, powders, and small 3-D objects with and without plasma.
Ghent University has been developing its particle and powder coating technologies focusing on surface functionalization uses. "There have been an increasing number of possible applications for nanocoatings on particles and powders emerging over the past decade that require atomic level control of layer thickness and uniformity," said Christophe Detavernier, Professor at Ghent University. "ALD has proven to be a very reliable method for depositing ultrathin, conformal coatings on powders."
"The Cyprus Particle Coating system expands the ability to deposit thin films on powders by utilizing thermal and plasma ALD in a single platform. This in turn and can allow users to take advantage of the full spectrum of additional benefits such as improved nucleation rates, decreased processing temperature, and improved film quality offered by plasma assisted ALD processes," explains Ganesh Sundaram, Vice President of Technology at Cambridge NanoTech. "Additionally, the rotary reactor architecture of the system was specifically developed to ensure optimal conformal coatings, without the complexity of traditional fluidized approaches."
This partnership was officially announced at the 12th International Conference on Atomic Layer Deposition (ALD 2012) which took place last week in Dresden, Germany. The University of Ghent presented its research titled "A rotary reactor for thermal and plasma-enhanced atomic layer deposition on powders and small objects." In addition, Cambridge NanoTech scientists presented their work on spatial ALD, In-situ QCM and spectroscopic ellipsometry, and Self Assembled Monolayers.
The announcement comes just weeks after Cambridge NanoTech was recognized the Boston Business Journals Pacesetters list for the fourth consecutive year. With 202.61% revenue growth over three years (2008 - 2011), Cambridge NanoTech ranked #5 out of 73 of the areas Fastest-Growing Companies. In addition, Cambridge NanoTech ranked #28 on the list of Top 50 Fastest-Growing Women-Owned/Led Companies by the Women Presidents' Organization, in partnership with American Express, OPEN.
About Cambridge NanoTech
Cambridge NanoTech delivers Atomic Layer Deposition (ALD) systems capable of depositing ultra-thin films that are used in a wide variety of research and industrial applications. Our manufacturing ALD systems are used in the production of semiconductors, flat panel displays, and solid state lighting. Cambridge NanoTech research systems are used by world class scientists on five continents to study superior ALD film properties such as electrical, anti-bacterial, UV-blocking, and anti-reflection. To learn more about Cambridge NanoTech, please visit www.cambridgenanotech.com.
Source: Cambridge NanoTech (press release)
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