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Posted: Aug 24, 2012
IMS Nanofabrication Announces Participation of TSMC in the Electron Multi-Beam Mask Writer Collaboration
(Nanowerk News) IMS Nanofabrication AG (IMS) announced today that Taiwan Semiconductor Manufacturing Co., Ltd. (TSMC) has joined IMS’ multibeam mask writer development collaboration, adding its support to that of collaboration founding members Dai Nippon Printing Co., Ltd. (DNP), Intel Corporation and Photronics Inc. The purpose of the collaborative program is to develop an electron multi-beam mask writer for use in advanced mask lithography applications with the goal of meeting lithography specifications below 10nm while achieving high throughput requirements. The program is nearing the completion of a proof-of-concept phase, and the upcoming phase of the collaboration will focus on the design and construction of an alpha and beta version of the multi-beam mask writer.
“The newly started development of alpha and beta electron multi-beam mask writer tools is strongly supported by TSMC joining the collaboration with DNP, Intel, and Photronics,” said Elmar Platzgummer, CEO / CTO of IMS.
C.S. Yoo, head of E-Beam Operation (EBO) at TSMC said: “We are pleased to work with IMS and other partners in the industry on this multi-beam mask writer project. We are very encouraged by this partnership's goal of producing a mask writer with both accuracy and high productivity around 2015 for nodes beyond 10 nanometers. This project shows great potential for producing that breakthrough.”
The founding members welcome the addition of TSMC and believe that the collaboration demonstrates solid industry support from both merchant mask makers and captive mask shops. IMS believes that by enlisting customers early in the development phase, the design and operation of this new architecture will readily adapt to the needs of a high volume manufacturing environment. The collaboration participants will provide input to IMS on mask manufacturing issues that are critical to leading-edge device manufacturers and to leading merchant mask makers. Collaboration members expect to benefit from early access to the electron mask exposure tool (eMET) technology and from the commercialization of the technology in partnership with additional industry players. This collaboration is representative of a new approach to managing development programs that are needed to address critical demands in mask making.
DNP is one of the world's largest comprehensive printing companies. DNP's wide range of businesses include publication printing, commercial printing, smart cards, business forms, network business and electronic components, among others. Its products in the electronics field include color filters and other components for LCDs, photomasks, PCBs and semiconductor-related components. In the photomask market DNP is a world leader, utilizing its time honored printing techniques and know-how in the fabrication of cutting- edge photomasks. For more information on DNP, please visit: http://www.dnp.co.jp/eng/
IMS Nanofabrication AG (“IMS”) is an Austrian based high-tech company that was founded in December 2006 through the merger of the former IMS Nanofabrication GmbH and IMS - Ionen Mikrofabrikations Systeme GmbH. Based on its extensive know-how in charged particle systems, IMS offers solutions to directly transfer custom designed patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers. IMS focuses its efforts on the development and production of key tool components for mask writing and direct write lithography applications. It plans to commercialize its technology and related services in cooperation with the strategic investors participating in this funding round and with other parties involved in the mask and lithography ecosystem. For more information on IMS Nanofabrication AG, visit: www.ims.co.at