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Posted: Aug 28th, 2012
Carl Zeiss Announces Significant Smaller Footprint of New Generation Photomask Metrology System PROVE Compact
(Nanowerk News) The new generation photomask registration and overlay metrology system PROVEŽ Compact, developed by Carl Zeiss, now has a reduced footprint of 30 % compared to its predecessor. Through a new design concept the system now consists of one main unit and two satellites, which can be clearly separated. With the new dimensions Mask Shops gain a higher flexibility and, even more important, save costs of ownership.
The first PROVEŽ Compact tool was ordered by an US-based semiconductor manufacturer. The shipment took place by mid of July and is currently in installation. A second system will be delivered shortly.
"Our customers benefit massively from the new footprint since it saves a lot of expensive cleanroom space. After eighteen months only we are able to launch the new generation PROVEŽ Compact. This short development project demonstrates the excellent team work within Carl Zeiss and our major subcontractors." Comments Dr. Dirk Beyer, Product Manager PROVEŽ Compact at Carl Zeiss SMS GmbH.
The PROVEŽ Compact system measures registration and overlay on photomasks with sub-nanometer repeatability and accuracy meeting your pattern placement requirements for todays and future nodes.
More information about PROVEŽ Compact can be obtained during SPIE Photomask Technology/Bacus conference in Monterey/CA between September 11 - 13, 2012.
Semiconductor Manufacturing Technology
The Semiconductor Manufacturing Technology business group of the Carl Zeiss Group comprises Carl Zeiss SMT and its subsidiaries Carl Zeiss Laser Optics and Carl Zeiss SMS. With a broad portfolio of products and globally leading know-how in the areas of lithography and optical modules, the business group covers various key processes in microchip production: as a developer and manufacturer of lithography optics, for example, Carl Zeiss SMT is a technology and market leader in this sector of the semiconductor industry. The portfolio of Carl Zeiss Laser Optics includes optical components for lithography lasers and subsystems for wafer inspection systems. With its inspection, repair and metrology systems, Carl Zeiss SMS focuses on the photomask, one of the core components of chip fabrication. In fiscal year 2010/11 the three divisions generated revenue of around 1.2 billion euros with a workforce of about 2,100 people. The business group is headquartered in Oberkochen. http://www.zeiss.com/sms