The latest news from academia, regulators
research labs and other things of interest
Posted: Dec 20, 2012
NIKON and A*STAR to Collaborate on Advanced Lithography Technology
(Nanowerk News) Nikon Corporation and A*STAR Institute of Microelectronics (IME), a leading semiconductor research institute of Singapore, have announced a collaboration with an agreement to jointly set up a research and development (R&D) laboratory to develop advanced optical lithography technology used in the manufacturing of semiconductor chips.
Nikon and IME will collaborate on technologies such as multiple patterning and directed self assembly techniques to drive the extension of ArF Deep Ultraviolet (DUV) dry and immersion lithography down to geometry of 20nm and beyond, targeting advanced applications including logic, high density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems (NEMS).
For Nikon, this is a strategic addition to new capabilities in Singapore. This collaboration will allow Nikon to tap into IME’s advanced R&D infrastructure, process technology and talent pool to get early insights into its next-generation systems which will shorten time-to-market. It will open opportunities to Nikon to learn required technology for future process, and continue pushing ArF immersion lithography for several device nodes.
The new capabilities will enhance and expand IME’s joint collaborations with industry partners, research institutes and universities to develop advanced technologies such as metrology and materials for further technology shrinkage as well as manufacturing excellence. The Joint Lab exemplifies how IME is able to develop and nurture a local ecosystem for advanced R&D through partnerships with leading corporations.
“Through this collaboration with IME, Nikon will gain knowledge of future process technology and total solution, which will be important for our lithography system development. We are very excited to partner with one of the most advanced and established institute in the Asia region,” said Mr. Kazuo Ushida, President of Nikon Precision Equipment Company.
“The Joint Lab synergizes IME and Nikon capabilities to drive R&D leading to future technology nodes. Nikon is an ideal technology partner well established in technical excellence to help IME enhance and expand our R&D capabilities to meet the needs of the industry,” said Prof. Dim-Lee Kwong, Executive Director, IME. “The Joint Lab is a significant milestone for advanced semiconductor R&D in Singapore.”