| Posted: Jan 25th, 2013 | |
Toshiba to Showcase Leading-Edge Technologies to nano tech 2013 |
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| (Nanowerk News) Toshiba Corporation today announced the line-up of innovative technologies that it will bring to "nano tech 2013 – The 12th International Nanotechnology Exhibition & Conference", the world's biggest exhibition of nanotechnology, that will be held at the Tokyo Big Sight from January 30 to February 1. | |
| Toshiba has worldwide operations in the smart community business segment that is considered as a future growth area. In the coming exhibition, Toshiba will exhibit its next-generation nanotechnology that will help drive "Total storage innovation" and "Total energy innovation". These innovations will serve as catalysts for realizing a smart community concept proposed by Toshiba Group. | |
| Toshiba Group will demonstrate its wide-ranging nanotechnologies in 14 technology fields in three exhibition areas, each of which will focus on "Total storage innovations", "Advanced and Sophisticated Material" and "Total energy innovations". | |
| Total Storage Innovations | |
| 1. NAND flash memory with advanced process technology. State-of-the-art 19 nm NAND process technology; speed demonstration of hybrid drive (hard disk drive integrated with NAND flash memory) | |
| 2. Trilayer structure head for hard disk drive. Material and design technologies for nanostructures and magnetic films necessary to realize read heads for large-capacity hard disk drives | |
| 3. State-of-the-art mask patterning technology. State-of-the-art (hp22nm device) e-beam mask patterning technology required for next-generation semiconductor processes | |
| 4. Directed Self-Assembly Lithography (DSAL). Low-cost nanopatterning technology for the 10 nm node by polymer coating, annealing and development | |
| 5. Advanced material analysis technique with nanometer spatial resolution. Atomic-level device structure analysis technology that underpins semiconductor reliability | |
| 6. Transparent conducting films composed of graphene and silver nanowire. Technology for forming multi-layer films composed of graphene, silver nanowires and polymers to realize transparent conducting films that help reduce the weight and increase the flexibility of photoelectric devices | |
| Advanced and Sophisticated Materials | |
| 1. Nitride ceramics with high thermal conductivity. High-thermal-conductivity, high-insulation and high-strength ceramic boards to cut the power consumption, reduce the size and improve the performance of electronic components and modules | |
| 2. Nanostructure-controlled luminescent materials (S-SIALON Phosphor / X-ray Scintillator Gd2O2S:Pr (GOS)). Phosphor material technology that enables light emission control according to applications such as LED lighting and X-ray inspection systems | |
| 3. New feature tungsten material (Photocatalyst, Thoria free electrode). Tungsten material technology that leads to the manifestation of new features or high performance as photocatalysts, thermionic electrodes, etc. | |
| Total Energy Innovations | |
| 1. Organic photovoltaics. Nanostructure control technology for organic films to realize organic-film photovoltaic cells with worlds' highest conversion efficiency suitable for use in indoor lighting | |
| 2. Dy-free permanent magnet for motors. Nanoscale fabrication technology for magnet materials to realize high-efficiency motors with reduced natural resource risks | |
| 3. Rechargeable battery SCiB™ for automotive and stationary applications. Nano LTO Composite electrode technology and applications to realize high-performance rechargeable batteries with high input/output, low resistance and long life | |
| 4. Superconducting filter for weather radar. Nano-interface control technology for a superconducting filter designed for weather radar capable of observing localized torrential downpours | |
| 5. Next-generation lighting (OLED lighting, LD-excitation light source). Organic film structure control technology to realize OLED lighting for everyday life and LD excitation light sources |
| Source: Toshiba (press release) |
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