Rigaku Innovative Technologies Presents New Line of EUVL Product Solutions
(Nanowerk News) Rigaku Innovative Technologies (RIT), a leading global supplier of multilayer optic technology for EUV lithography (EUVL), has unveiled its new line of EUVL solutions to support high volume EUV Lithography in conjunction with successful appearances at the 2013 International Symposium on Extreme Ultraviolet Lithography in Toyama, Japan.
During the symposium, RIT presented its advanced IR Rejection Collector (IRRC) technology for high-power EUV sources. In a standing-room-only reception hosted by RIT at the symposium, the company displayed a full-size version of its IR Rejection Collector Optic. It is a fully tested, critical EUVL component with EUV reflectivity of 65% for polarized light, 51% for unpolarized light, and IR rejection exceeding 99%. The IRRC collector optic provided the basis of RIT's oral presentation at the conference on Oct. 10.
RIT concurrently unveiled its new product line, MaxEUV™, which features high-efficiency multilayer optical elements for use with 13.5 nm, 6.x nm and XUV wavelengths in applications including Illumination & Imaging systems. RIT also provided examples of custom multi-layer based mirrors, which are available in any size, shape and wavelength of choice, optimized to meet specific customer requirements.
RIT's presence at the symposium coincides with major announcements for expansion at its Auburn Hills, Michigan facility, which supports world-wide Engineering, Manufacturing and Sales activities. With over $9M investment this year in state-of-art multilayer coating & actinic metrology facilities, RIT will continue to position itself as the Industry leader in the next generation of EUV optics deposition and measurement capabilities, as well as the premier provider of EUV Collectors, Illumination and Imaging Optics for lithographic applications.
RIT is at the forefront of Multilayer optic technology for EUV Lithography. Formerly Osmic Inc., RIT was the first commercial supplier of multilayer optics for X-ray Sciences. Since 1993 RIT has been a global leader in the development and supply of EUV optics thus shaping the vision of EUVL for high volume manufacturing. With hundreds of major innovations to its credit, Rigaku and its subsidiary companies are world leaders in the fields of small molecule and protein crystallography, X-ray spectrometry and diffraction, X-ray optics, as well as semiconductor metrology. Rigaku employs over 1,100 people globally and its products are in use in more than 70 countries -- supporting research, development, production control and quality assurance activities. Throughout the world, Rigaku continuously promotes partnerships, dialog, and innovation within the global scientific and industrial community. For additional information about RIT and its EUV related product, please visit www.rigaku.com/products/optics/euv