Brion Technologies, a division of ASML, today announces a new product for semiconductor manufacturers who need the most powerful computational lithography for the next node of chip manufacturing, for a new generation of faster and more energy-efficient electronic devices.
The aim of the internationalization award is to promote company activities in an international environment and their ability to develop and implement new operating models. It is also intended to encourage the winning companies' internationalization and that of other Finnish companies.
ASELTA Nanographics develops software solutions that reduce manufacturing writing time costs for chips at the 32nm node and beyond while improving pattern fidelity, including cycle time and lithography-image quality.
Founded by veterans of Argonne National Lab, NCBI, Integrated Genomics and Ariadne, the company is taking on the challenge of functional annotation of the next-generation sequencing projects for the life science community.
Industrial Nanotech, Inc., today announced that the Company has made its first sale to a nuclear power facility in the United States of its patented nanotechnology based insulation and protective coating line, Nansulate.
Demonstrating its commitment to delivering leading-edge technologies and solutions for enterprise-class servers and storage systems, Hitachi Global Storage Technologies (Hitachi GST) today announced that its Ultrastar enterprise-class solid state drive (SSD) family is the industry's first to use 25-nanometer single-level cell (SLC) NAND flash.
Dolomite, a world leader in the design and manufacture of microfluidic systems and devices, has had continued exceptional growth in 2011 with the launch of over 15 new products including the Mitos P-Pump Basic, Mitos P-Pump Remote, a novel range of Multiflux Connectors and Interfaces as well as various Optical Systems for high quality capture of microfluidic experiments.
The Hiden Analytical HPR-40 Membrane Inlet Mass Spectrometer series now feature an extended range of submersible insertion probes and flow-through semipermeable membrane interfaces, specifically engineered for measurement of dissolved gases and vapours in aqueous solution in diverse environments and applications.
Veeco Instruments Inc. announced today that LG Siltron, a South Korean epi wafer manufacturer, recently selected the TurboDisc K465i gallium nitride Metal Organic Chemical Vapor Deposition (MOCVD) System for production of gallium nitride on silicon wafers for power electronics and LED devices.
SUSS MicroTec, a leading supplier of equipment and process solutions for the semiconductor and related markets, launched the XBC300 Gen2, a high volume manufacturing platform for advanced 3D processing.