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The Hiden 3FD Fast-response Mass Spectrometer

The 3F-series of quadruple mass spectrometers from Hiden Analytical now feature direct digital signal detection for our fastest response and most sensitive detection levels, addressing the needs of the researcher operating in the UHV/XHV vacuum regime through to specialised fast-event gaseous studies at pressures to atmosphere and beyond.

Posted: Nov 16th, 2011

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FEI Buys TILL Photonics

TILL provides sophisticated, high resolution, digital light microscopes and high speed imaging systems for live cell fluorescence microscopy.

Posted: Nov 14th, 2011

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LOT launch the IBIS Nanoindentation Tester from Fischer Cripps

IBIS is a precision nanoindentation tester offering traceable calibration, robust design, closed loop operation, solid theoretical base, and unmatched accuracy, reliability and price. IBIS Nanoindentation Tester is compatible with ISO14577 and a range of models are available to suit all budgets.

Posted: Nov 14th, 2011

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Bruker and Lawrence Berkeley National Laboratory Collaborate on Novel Technology for Structural Biology

Bruker Corporation and Lawrence Berkeley National Laboratory (Berkeley Lab) today announced a collaboration to develop and distribute new structural biology methods and tools to integrate Small-Angle X-ray Scattering (SAXS) with Nuclear Magnetic Resonance (NMR). The goal of this collaboration is to develop a set of integrated SAXS and NMR data analysis algorithms for determining the structures of larger multi-domain proteins and protein complexes with DNA, RNA or other proteins.

Posted: Nov 10th, 2011

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Novellus Introduces Ceramic Hard Mask Materials for Use in Sub-22nm Back-End-of-Line Patterning

Novellus Systems announced today that the company has developed new ceramic hard mask materials for use in sub-22nm patterning applications. Deposited using Novellus' industry-leading VECTOR plasma-enhanced chemical vapor deposition (PECVD) platform, the new materials allow for the controlled incorporation of dopants into the company's family of silicon carbide and silicon nitride films.

Posted: Nov 9th, 2011

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SEMATECH and Applied Seals Partner at UAlbany NanoCollege to Enable Defect-Free EUVL Masks for High-Volume Manufacturing

SEMATECH, a global consortium of chipmakers, announced today that Applied Seals North America, Inc., a leading provider of elastomeric sealing for the semiconductor, pharmaceutical, biotechnology and solar industries, has joined SEMATECH's Mask Blank Defect Reduction program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

Posted: Nov 9th, 2011

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