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Nanosolar Achieves 17.1% Aperture Efficiency Through Printed CIGS Process
Thin film solar printing leader Nanosolar, Inc. today announced that the U.S. Department of Energy's National Renewable Energy Laboratory (NREL) has certified an aperture efficiency of 17.1% for a solar cell fabricated using Nanosolar's non-vacuum, low cost printing on flexible foil technology.
Posted: Oct 6th, 2011
Read moreARM and UMC Extend Long-Term IP Partnership into 28nm
ARM and UMC, a leading global semiconductor foundry, today announced a long-term agreement that provides UMC foundry customers with access to the latest advanced ARM Artisan Physical IP solutions validated on UMC's 28HPM process technology.
Posted: Oct 6th, 2011
Read moreRUSNANO and I2BF Global Ventures Invest in Ultracapacitor Manufacturer Nesscap Energy
Proceeds from this financing will be used as to approximately $15,000,000 for the establishment of a full scale production facility for ultracapacitors and fundamental research center in the Russian Federation and as to approximately $5,000,000 for the expansion of Nesscap's current manufacturing and core R+D operations in Korea and for general corporate purposes.
Posted: Oct 6th, 2011
Read moreCrocus and IBM Sign Technology Development and Patent License Agreements
Companies to jointly develop next generation magnetic memory technology.
Posted: Oct 5th, 2011
Read moreAMD Demonstrates Next Generation 28nm Graphics Processor at Fusion 2011
At Fusion 2011, AMD today demonstrated its next generation graphics processor, based on the cutting-edge 28nm process technology.
Posted: Oct 5th, 2011
Read moreeSilicon and MIPS Technologies Announce Tapeout of 28nm 1.5GHz Microprocessor Cluster for Embedded Platforms
eSilicon Corporation, the largest independent semiconductor value chain producer (VCP), and MIPS Technologies, a leading provider of industry-standard processor architectures and cores, announced the tapeout of a high-performance, three-way microprocessor cluster on GLOBALFOUNDRIES' leading-edge, low-power 28nm-SLP process technology.
Posted: Oct 5th, 2011
Read moreDow and Argonne National Laboratory Collaborating on New Battery Materials
Dow and Argonne will be collaborating on several new materials with the intent to improve the performance, cost competitiveness and adoption of these advanced materials in the energy storage industry.
Posted: Oct 5th, 2011
Read moreApplied NanoFluorescence Introduces NS3 NanoSpectralyzer for Multimode Spectrometry of Nanomaterials
Applied NanoFluorescence LLC has introduced the model NS3 NanoSpectralyzer for multimode spectrometry of nanomaterials.
Posted: Oct 4th, 2011
Read moreAnalog Bits Uses Berkeley Design Automation to Deliver 100 Gbps 40nm PLL IP Silicon Success for SoC and Cloud Computing Applications
Berkeley Design Automation, Inc., provider of the world's fastest nanometer circuit verification, today announced that Analog Bits, a leading provider of integrated clocking and interface IP, has adopted and achieved excellent silicon correlation using the company's Analog FastSPICE Platform for accurate performance characterization of a 40nm nanometer Phase-Locked Loop (PLL) clocking circuit IP.
Posted: Oct 4th, 2011
Read moreArrowhead Research Corporation Completes $5.5 Million Private Placement
At market offering led by noted investor Jim Mellon; Proceeds to fund nanomedicine programs.
Posted: Oct 4th, 2011
Read moreJPK Instruments Launch the NanoWizard3 NanoOptics AFM System
JPK Instruments, a world-leading manufacturer of nanoanalytic instrumentation for research in life sciences and soft matter, continue to expand its family of high performance research systems with the announcement of the availability of the NanoWizard 3 NanoOptics AFM system.
Posted: Oct 4th, 2011
Read moreJEOL Opens New Office in Brasil
A leading supplier of electron microscopes and scientific instrumentation, JEOL USA and its parent company JEOL Ltd. have opened an office in Sao Paulo, Brasil to support its growing installed base there, and have relocated the personnel to a new facility this month.
Posted: Oct 3rd, 2011
Read moreTESCAN Introduces the First Plasma FIB-FESEM Workstation
TESCAN, a world leading manufacturer of scanning electron microscopes and focused ion beam workstations has introduced the FERA3 XMH - a high resolution Schottky Field Emission scanning electron microscope with a fully integrated Plasma source focused ion beam. The system has been developed in co-operation with the French company Orsay Physics.
Posted: Oct 3rd, 2011
Read moreTegal Announces Extension of Bid Deadline for Nanolayer Deposition Patent Portfolio
Tegal Corporation announced that bids for the company's intellectual property portfolio for Nanolayer Deposition Technology (NLD) will be accepted until 5 p.m. PDT on October 15, 2011.
Posted: Oct 3rd, 2011
Read moreNanoco Signs Further Agreement with Tokyo Electron
Nanoco Group plc, a world leader in the development and manufacture of cadmium-free quantum dots and other nanomaterials, announces that it has signed a further agreement with Tokyo Electron, the major Japanese equipment supplier, following the successful completion of the initial phase of development of a nanomaterial-based solar film.
Posted: Oct 3rd, 2011
Read moreSiMPore Awarded Phase I SBIR From NIH To Improve TEM Imaging Technology For Biomedical Researchers
SiMPore Inc., an early-stage nanotechnology company in Rochester, NY, has received a Phase I SBIR grant from the National Institutes of Health to improve phase contrast transmission electron microscopy.
Posted: Sep 29th, 2011
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