RUSNANO and Cleveland BioLabs, Inc. announce that they have entered into an agreement to provide funding for CBLI's new subsidiary, Panacela Labs, Inc., which will develop a portfolio of new preclinical drug candidates.
FutureCarbon, Bayreuth-based producer of carbon supercomposites, and its south-German sales partner Goessl+Pfaff are jointly showing innovative solutions to heat composite components at this year's Composites Europe from 27 through 29 September 2011.
Contestants from Harvard University, MIT, Boston University and the University of Massachusetts raced each in the closely fought race to measure the particle concentration and size of a bimodal distribution of nanoparticles.
Samsung Electronics Co., Ltd., the world leader in advanced memory technology, announced today that it has begun operations of its new Line-16 memory semiconductor fabrication facility, which will provide the industry's largest production capacity.
Following the global success of the Mitos P-Pump, microfluidics expert Dolomite has launched the Mitos P-Pump Basic offering a flexible and cost effective solution for microfluidic systems operating from nl/min to ml/min.
The new capital will facilitate the Company's production ramp for its new industrial scale nanofiber equipment formally launching later this year. The financing will also be used for workforce expansion in Manufacturing, Customer Service, Engineering and Sales and Marketing departments.
Mentor Graphics Corporation and NuFlare Technology, Inc. today announced the extension of their successful collaboration on integrated hardware and software solutions for advanced IC mask generation. The companies' new joint marketing and support agreement will help ensure seamless interfaces, high mask fidelity, fast mask writing times, and very high levels of technical support.
Nanotechnology instrument manufacturer Izon Science will host the Inter-University Nanotechnology Measurement Championships in Cambridge, Massachusetts tomorrow. Contestants from Harvard University, MIT, Boston University and the University of Massachusetts will race each other to accurately measure a complex set of nanoparticles in real time to decide a winner.
The Centura Tetra EUV system extends Applied's long-standing mask etch leadership through a design specifically attuned to etch the new materials and complex film stacks used in EUV photomasks, meeting the stringent pattern accuracy, surface finish, and defectivity specifications required to achieve high lithography yields when operating in this reflected mode.
Brion Technologies, a division of ASML, today announced a new product for its popular Tachyon computational lithography platform. Tachyon MB-SRAF (Model-Based Sub-Resolution Assist Features) enables the high-speed, full-chip processing of advanced chip designs with larger process windows, greater productivity, and lower development costs than rule-based alternatives.