Programmable "correlated" electromagnet array technology from Correlated Magnetics Research (CMR) was recently selected by the Society of Manufacturing Engineers as one of the 2011Innovations That Could Change the Way You Manufacture.
Motion control specialist PI (Physik Instrumente) and piezo ceramics specialist PI Ceramic are planning to invest approximately $13 million for the third extension of their piezo ceramics factory and R+D center in Thuringia over the next three years.
Elan Drug Technologies (EDT), the leading drug delivery unit of Elan Corporation, plc, announced that the first injectable product using EDT's NanoCrystal technology has been approved by the European Commission.
RUSNANO and Optogan, a RUSNANO investment-partner, entered the Fast Company list of the ten most innovative companies in Russia, taking fourth and seventh place, respectively. The rating of innovative companies in Russia is part of Fast Company's annual global research.
Xanofi, a company specializing in producing custom, low-cost, functional nanofibers for applications announces their upcoming event schedule and demonstrations. The company is currently identifying industry partners that seek nanotechnology solutions for their products.
Natcore Technology Inc. begins work on the first production model of its intelligent LPD processing station for growing an antireflective (AR) coating on silicon wafers in the process of becoming solar cells.
AIXTRON SE today announced an order for MOCVD reactors from new customer Beiji Haotian Technology Co., Ltd. The order for a total of five systems comprises two AIX 2800G4 HT deposition systems in the 42x2-inch configuration and three AIX G5 HT deposition systems in the 56x2-inch configuration.
Applied Materials, Inc. announced a technology breakthrough for inspecting the challenging interconnect layers in 22nm and below memory and logic chips. The new Applied DFinderTM inspection system is the first darkfield tool to employ deep ultraviolet (DUV) laser technology, providing chip manufacturers with an unprecedented ability to detect exceptionally small particles on patterned wafers in a production environment for higher device yield.