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DEK Expands Applications and Engineering Capability in the Americas

Building on its solid reputation for facilitating next-generation SMT and semiconductor print processes, DEK today announced that it has further expanded its Americas engineering capabilities with the investment of additional resource to support the company's growing alternative energies business.

Posted: Mar 3rd, 2011

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Nanosurf and Zurich Instruments Join Forces

Nanosurf, a leading provider of atomic force microscopes (AFM) and scanning tunneling microscopes (STM), and Zurich Instruments, technology leader for lock-in amplifiers and phase-locked loops (PLL), today announced a strategic technology partnership.

Posted: Mar 3rd, 2011

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National Science Center of Greece Selects Nano-research Technology From Vistec

Vistec Lithography Inc., a leading supplier of electron-beam lithography systems, received a major order from Greece. The National Center for Scientific Research (NCSR Demokritos) has bought an EBPG5000plusES system for one of its associated Institutes. Installed at the Institute of Microelectronics (IMEL), the system will be the first 100kV lithography system in Greece and assure multidisciplinary cutting-edge nano-research.

Posted: Mar 3rd, 2011

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New Software Helps Coatings and Restricted Substance Decisions

Granta Design has announced extensions to its GRANTA MI software that help Product Designers, Materials and Process experts, and Environmental, Health and Safety professionals to make vital decisions on coatings and surface treatment. The new capabilities, developed in collaboration with Rowan Technology Group, focus on the complex compliance, regulatory, and risk factors relating to restricted substances.

Posted: Mar 3rd, 2011

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Synopsys Introduces Proteus LRC For Lithography Verification

Synopsys, Inc., a world leader in software and IP for semiconductor design, verification and manufacturing, today introduced Proteus LRC for lithography verification. Proteus LRC provides comprehensive, process-window-aware checking features to identify locations in a design that are sensitive to process variations, thereby enabling corrective action to be taken prior to committing a design to manufacture.

Posted: Mar 2nd, 2011

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iVeia Announces the Atlas-I-Z7e Small Form Factor Processing Module

At Embedded World 2011, iVeia today announced the Atlas-I-Z7e, a small form factor processing module featuring the newly launched Zynq -7000 Extensible Processing Platform from Xilinx. The Zynq devices integrate 28-nm FPGA technology with embedded dual ARM Cortex-A9 processors enabling a new level of performance for low-power applications.

Posted: Mar 2nd, 2011

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