Novellus Systems Introduces VECTOR Extreme TEOS xT - The Fastest PECVD Tool in the Semiconductor Industry
Novellus Systems announced that it has made multiple shipments of its new VECTOR Extreme TEOS xT system to leading memory manufacturers around the world. The VECTOR Extreme TEOS xT is based on the highly successful VECTOR Extreme platform. It is capable of production throughputs in excess of 300 wafers per hour, making it the fastest plasma enhanced chemical vapor deposition (PECVD) system in the industry.
Posted: Jan 26th, 2011Read more