Lumerical Solutions, Inc., a global provider of nanophotonics design software, today announced the immediate release of FDTD Solutions 7.5. This release features a concurrent computing capability which allows users to easily distribute simulations on multiple independent computer resources.
Following the success of its PV1200 and Eclipse photovoltaic metallization platforms, DEK Solar has confirmed that it has added manufacturing capabilities in China. An expansion of the company's successful SMT manufacturing facilities in the region, the move extends DEK Solar's global footprint to service the growing demand for its PV platforms in Asia.
Nanostart AG, the Frankfurt-based nanotechnology investment company, has expressed its strong support for the "Nanotechnology Action Plan 2015" announced yesterday by the German federal government, the aim of which is to build a strong and long-term basis to derive maximum benefit from the high potential offered by nanotechnology.
Molecular Imprints, Inc., a market and technology leader for nanoimprint lithography systems and solutions, today introduced the Perfecta MR5000 - its new Jet and Flash- Imprint Lithography (J-FIL) imprint mask replication platform for the semiconductor industry.
TowerJazz, the global specialty foundry leader, announced the availability of additional SiGe process design kits (PDKs) for TowerJazz's 0.18 um SiGe process platform. The design kits target high-frequency products for optical networks, automotive radar and 60GHz WiFi, as well as high-power front-end-modules for wireless handsets.
The National Science Foundation awarded a Small Business Innovative Research (SBIR) Phase 1 grant in the amount of $149,000 to GoNano Technologies, Inc. The objective is to demonstrate the technical feasibility of a novel four-way catalytic converter for diesel emissions.
The University of Notre Dame has named Olympus a key partner for its prestigious College of Engineering. The college recently constructed a new 160,000-square-foot, $70 million structure called Stinson-Remick Hall, which houses a nanotechnology research center, the University's new Energy Center, an undergraduate interdisciplinary learning center and a 9,000-square-foot semiconductor processing and device fabrication clean room.
Ultratech, Inc., a leading supplier of lithography and laser-processing systems used to manufacture semiconductor devices and high-brightness LEDs (HB-LEDs), today announced the release of its new field-tested LSA101 laser spike annealing (LSA) system, which enables critical millisecond annealing applications for the 28-nm node and beyond.
NanGenex Inc. has successfully completed the chemical validation of its latest GMP compliant pilot plant reactor. This is the first milestone towards fulfilling production needs of the clinical development of NanGenex's NanoActive products.