The National Nanotechnology Center (NANOTEC) and Bangkok Botanica from Thailand have entered into a research contract agreement, whereby NANOTEC Nano-cosmeceuticals Laboratory will work to develop disposable gauze containing metal or metal oxide nanoparticles capable of performing sterilization and antibacterial function.
mPhase Technologies, Inc. today announced that it will be showcasing it's Smart NanoBattery technology at the 2010 National SBIR Beyond Phase II Conference and Technology Showcase, September 13-17, 2010, San Antonio, Texas.
The Fab Owners Association (FOA), the association of semiconductor device manufacturing executives and suppliers, has announced that its membership has reached 63 members with the addition of several new members.
Genomas, a biomedical company advancing DNA-Guided Medicine, has been awarded US Patent 7,747,392, entitled Physiogenomic Method for Predicting Clinical Outcomes of Treatment in Patients by the US Patent and Trademark Office.
The Company announced today the US Department of Energy's Advanced Research Project Agency, Energy (ARPA-e) , has awarded the Company $680,000 in a one year grant to leap-frog to commercialization its energy efficient, water based heating, cooling.
The new plant in Livonia, Mich. is expected to expand A123's manufacturing capabilities by up to 600MW hours per year when fully operational, contributing to the company's plan to expand global final cell assembly capacity to more than 760MW hours annually by the end of 2011.
Applied Nanotech Holdings, Inc. is pleased to announce that as part of its near and long-term commercialization strategy, it has named Dr. Samuel Kim as Vice-President of Business Development and hired Shahar Bar-Cohav as Director of Business Development.
To further enable its research in direct-write printing of micro- and nanoscale electronic devices, the Italian Institute of Technology's (IIT) Center for Nanoscience and Technology has purchased a JetLab 4xl-A maskless nanoprinting system from equipment supplier Altatech Semiconductor S.A.
Applied Materials, Inc. today announced its Applied Aera3 Mask Inspection system, enabling photomask and chip manufacturers to meet the most critical defect detection challenges for all photomasks at 22nm, using its proven aerial imaging technology.
Carl Zeiss introduces its PROVE Registration and Overlay Metrology System for photomasks at SPIE Photomask Conference in Monterey, CA. PROVE measures image placement on photomasks with superior resolution meeting the challenging requirements of the 32nm technology node and beyond.
In addition to its industry-leading lines of compound microscopes and stereomicroscopes, Leica Microsystems offers an innovative series of digital microscopes that bring new levels of flexibility and precision to meet the unique needs of QA professionals inspecting microelectronics and medical devices.