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Carl Zeiss Launches New Photomask Registration System

Carl Zeiss introduces its PROVE Registration and Overlay Metrology System for photomasks at SPIE Photomask Conference in Monterey, CA. PROVE measures image placement on photomasks with superior resolution meeting the challenging requirements of the 32nm technology node and beyond.

Sep 13th, 2010

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GE Healthcare Showcases Molecular Imaging Tools that Give Researchers Insight into Origins of Disease

Reinforcing its commitment to researchers and clinicians, GE Healthcare, a unit of General Electric Company is showcasing a comprehensive molecular imaging portfolio - encompassing tracer development, pre-clinical imaging and highly advanced imaging equipment - to provide insight into the origins of disease, at the World Molecular Imaging Congress (WMIC), Booth #212, September 8 through 11 in Kyoto, Japan.

Sep 9th, 2010

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Free workshop on nanomechanics

Asylum Research and Harvard University's Center for Nanoscale Systems (CNS) will conduct a free workshop with a focus on nanomechanics on September 30 to October 1, 2010.

Sep 9th, 2010

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