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eBeam Initiative Members Jointly Present Collaborative Results at SPIE/BACUS Symposium 2010

The eBeam Initiative, a forum dedicated to the education and promotion of a new design-to-manufacturing approach known as design for e-beam (DFEB), today announced that several of its members will jointly present the latest breakthroughs in DFEB mask technology at the Annual SPIE/BACUS Symposium 2010 - a worldwide technical conference and exhibition and premier event for the photomask industry.

Sep 8th, 2010

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