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POLYTEDA Announces Availability of Foundry-validated Runsets at UMC

POLYTEDA Software Corporation, a provider of advanced verification solutions, today announced the completion of a joint qualification program for POLYTEDA's PowerDRC/LVS product for leading global semiconductor foundry UMC's 65nm processes and the availability of foundry-validated runsets for PowerDRC/LVS.

Posted: Jun 5th, 2010

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Sensofar Introduces PLu neox, Their Most Advanced Optical 3D Profiler

The PLu neox is the most advanced Optical Profiler from Sensofar. Based on the successful series of PLu optical profilers, the neox covers the broadest range of applications on 3D and Thin film metrology due to the combination of Confocal Scanning, Phase Shift Interferometry, Vertical Scanning Interferometry and Spectroscopic Reflectometry.

Posted: Jun 2nd, 2010

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Collaboration at SEMATECH's Resist Center to Demonstrate EUV Materials and Resists for 22nm and Beyond

SEMATECH, a global consortium of chipmakers, and AZ Electronic Materials, the global supplier of electronic materials to the semiconductor and flat panel display industries, announced today that AZ Electronic Materials has joined SEMATECH's Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

Posted: Jun 2nd, 2010

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LVEM5 used by US Air Force Research Laboratory to Create Novel Bioassembled Materials

There is growing interest to create new materials with never-before-seen synergistic properties or additional functionality. One way to do this is to combine different materials, with different properties, together in order to create a new hybrid material. Often, it is a challenge to get these different materials together, especially at the nanoscale.

Posted: Jun 1st, 2010

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