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New Digital Camera from Leica for Fluorescence Applications

The detection and documentation of low light fluorescence signals in live cell experiments is a particular challenge for digital cameras. To meet this demand, Leica Microsystems adds the new Leica DFC345 FX to its portfolio of powerful digital cameras.

Posted: Nov 16th, 2009

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SEMATECH Names Daniel Armbrust as President and CEO

SEMATECH, the global consortium of semiconductor manufacturers, today announced that it has named Daniel Armbrust to serve as its President and Chief Executive Officer. Armbrust will succeed Michael R. Polcari, who has been appointed SEMATECH's Chairman of the Board.

Posted: Nov 16th, 2009

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Nanolaminated Materials to be Developed for Nuclear Power Application

Seattle-based Modumetal announced that it has received a Small Business Innovative Research contract from the Department of Energy (DOE) to demonstrate application of its nanolaminate and functional gradation technology to structures that would improve the longevity and safety of Gen IV nuclear power plants.

Posted: Nov 14th, 2009

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Nanometrics Receives Multiple Metrology Orders for High-Brightness LEDs

Nanometrics Incorporated, a leading supplier of advanced process control metrology systems used primarily in the manufacturing and packaging of semiconductors, solar photovoltaics and high-brightness LEDs, today announced multiple orders from new and existing HB-LED customers for RPMBlue and IVS185 metrology systems, which will be used for photoluminescence mapping and critical dimension and overlay control, respectively.

Posted: Nov 13th, 2009

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LayTec Introduces Solution for Measuring Exact Surface Temperature of GaN Layers

At the International Conference on Nitride Semiconductors (ICNS) in Korea on 18-23 October LayTec presented its latest product: Pyro 400. Unlike conventional infrared pyrometry, which can only detect the susceptor surface temperature under sapphire or SiC wafers, Pyro 400 is the first real solution for measuring the exact surface temperature of GaN layers.

Posted: Nov 12th, 2009

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SEMATECH Symposia Reveal Continuing Momentum in EUVL and 193 nm Immersion Extensions

SEMATECH engineers and the industry at large continue to make progress in developing the infrastructure that will enable lithography for cost-effective manufacturing, according to papers presented at the 2009 International EUVL (Extreme Ultraviolet Lithography) and 193 nm Immersion Extensions Symposia, held Oct. 18-23, in Prague, Czech Republic.

Posted: Nov 12th, 2009

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