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SEMATECH Symposia Reveal Continuing Momentum in EUVL and 193 nm Immersion Extensions

SEMATECH engineers and the industry at large continue to make progress in developing the infrastructure that will enable lithography for cost-effective manufacturing, according to papers presented at the 2009 International EUVL (Extreme Ultraviolet Lithography) and 193 nm Immersion Extensions Symposia, held Oct. 18-23, in Prague, Czech Republic.

Posted: Nov 12th, 2009

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Rudolph's Automated Data Analysis Software Improves Yield in MEMS Inspection

Rudolph Technologies, Inc., a worldwide leader in process characterization solutions for the semiconductor manufacturing industry, announced today that Touch Micro-System Tech, a major manufacturer of micro-electro-mechanical systems (MEMS) located in Taiwan, has reported a substantial reduction in per-wafer inspection time using Rudolph's NSX Inspection System and Discover Data Analysis software.

Posted: Nov 9th, 2009

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Applied Materials Acquires the Assets of Advent Solar

Applied Materials, Inc., the leading supplier of equipment and services to the solar photovoltaic (PV) industry, announced today that it has acquired substantially all the assets, including the intellectual property, of Advent Solar, Inc. for an undisclosed cash amount.

Posted: Nov 6th, 2009

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