Oxford Instruments' revolutionary X-Max large area Silicon Drift Detector (SDD) is now available for the analytical TEM. The ability to handle high count rates in a liquid nitrogen free environment, combined with INCAEnergy TEM software, ensures X-Max will maximise the performance of a TEM.
The SBIR grant will be used to further accelerate technological progression of Altairnano's advanced energy storage systems and batteries. The scope of the award supports development of new cell chemistries that can perform under extremely hot conditions.
Advanced lithium-ion automotive battery producer EnerDel and the Nissan Motor Co. of Japan are teaming up to research a new generation of electrical conductive material intended to reduce cost and improve the performance of electric and hybrid vehicle batteries.
The new reference flow provides designers with a reliable, UMC-validated methodology incorporating the latest in low power techniques and model-based DFM analysis and optimization capabilities for maximum power efficiency, superior quality of results, and accelerated yield ramp for advanced node designs.
Bioo Scientific, an Austin, TX based biotechnology company, announced today that it has been awarded a $500,000 Small Business Innovation Research (SBIR) Phase II grant from the National Science Foundation for the development of a targeted in vivo RNA Interference (RNAi) delivery technology.
Malvern Instruments has published work demonstrating how the Sysmex FPIA-3000 image analysis-based particle characterization system provides a reference method for validating particle size measurements of the porous silica materials used in high performance liquid chromatography (HPLC) columns.
ASM International N.V. today announced that it has sold its Pulsar Atomic Layer Deposition (ALD) system for high-k gates to two top Japanese logic device manufacturers for insertion in the 32/28nm technology node.
Virage Logic Corporation today announced it has extended its advanced IP technology leadership to the 32/28-nanometer process node with the tape out of a product test chip with multiple IPs optimized for a high performance application for an early adopter customer.
Third-generation ICP source improves DRIE productivity and yield for MEMS and 3D IC market applications; worldwide ProNova User Group accelerates DRIE learning cycles with multi-site process demonstration capabilities.
One of the world's leading suppliers of semiconductor solutions, ST will partner with GLOBALFOUNDRIES to produce products based on 40nm Low Power (LP) bulk silicon technology. The 40nm LP process is ideal for the next generation of wireless applications, handheld devices, and consumer electronics, which require excellent performance and long battery life.