HamaTech Advanced Process Equipment today announced it has entered into a partnership with the prestigious MIET Technical Institute of Moscow University. MIET, the advanced research institution in Russia, and HamaTech will work in close cooperation on activities to meet an aggressive mask manufacturing roadmap at a wide range of technology nodes.
The kit is fully validated on TSMC's 65 nanometer process and represents the newest design initiative to come from the company's Open Innovation Platform, focusing on enhancing innovation in custom, analog, mixed-signal and RF designs.
SAFC Supply Solutions, a member of the Sigma-Aldrich Group, today announced the launch of a diverse product offer designed to meet the demands of the burgeoning molecular diagnostics market and provide single-point access to a broad range of regulatory compliant and custom manufactured raw materials.
The Magellan is the only family of SEMs that provides high-throughput, sub-nanometer resolution at low accelerating voltages, while retaining the flexibility and ease-of-use that are characteristic of SEM technology.
Nanoco announces that Kisco Limited, a leading Asian electronics materials trading and manufacturing company headquartered in Osaka, Japan, purchased 2,870,339 Ordinary Shares in the Company on 15th July 2009.
Introduced in 2006, the Dektak 150 has been widely accepted as a superior solution for measuring thin film thickness, stress, and surface roughness and form in a wide range of settings, from educational research verification to semiconductor process control.
Energetiq Technology, Inc., a developer and manufacturer of specialized short-wavelength light products for advanced technology applications, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography, for excellent performance of the Energetiq EUV light source and the company's contribution to EUVL development.
Magma Design Automation Inc., a provider of chip design software, today announced availability of an advanced low-power IC implementation reference flow for the 65-nanometer process and low-leakage-process intellectual property from Semiconductor Manufacturing International Corporation.