New Quick Polymer Stamp available for Nanoimprint Module
NIL Technology now offers a Quick Polymer Stamp (QPS), facilitating a fast nanoimprint approach.
Posted: Apr 20th, 2009
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Chinese HB-LED Manufacturer Qualifies Veeco's MOCVD System
Veeco Instruments Inc. announced today that Shandong Raysun Huaguang Optoelectronics Co., Ltd. of China has qualified Veeco's gallium nitride and arsenic phosphide metal organic chemical vapor deposition systems for high volume production of red and blue high-brightness light emitting diodes.
Posted: Apr 20th, 2009
Read moreRudolph Joins SEMATECH's 3D Interconnect Program at UAlbany NanoCollege
Rudolph Technologies, Inc. and SEMATECH, the global consortium of leading chipmakers, announced today that Rudolph has joined SEMATECH's 3D Interconnect Program at the College of Nanoscale Science and Engineering of the University at Albany.
Posted: Apr 20th, 2009
Read moreNew Carl Zeiss Microscope Promises Significant Advance in Imaging of Live Cells
Zeiss has overcome the challenges of imaging deep inside living tissues with the launch of the LSM 7 MP, a purpose-built multiphoton laser scanning microscope that, for the first time, incorporates two separate scanners.
Posted: Apr 20th, 2009
Read moreDOE Awards QD Vision $700K to Develop Advanced Solid State Lighting Technologies
QD Vision, developer of nanotechnology-based products for lighting and displays, today announced it has been selected by the Department of Energy (DoE) to receive more than $700,000 in funding for a project that will significantly contribute to the development of enhanced solid state lighting technologies.
Posted: Apr 20th, 2009
Read moreARM Announces Most Comprehensive IP Platform for TSMC's 40nm G Manufacturing
ARM today announced the availability of the industry's most comprehensive IP platform for TSMC's 40nm G manufacturing process.
Posted: Apr 20th, 2009
Read moreSunfilm and Applied Materials Achieve Solar Industry Milestone
Sunfilm, AG and Applied Materials, Inc., today announced that the world's first tandem junction SunFab Thin Film Line installed at Sunfilm's Grossroehrsdorf facility achieved factory acceptance on April 14, 2009.
Posted: Apr 20th, 2009
Read moreNanotechnology-based Biosensor for Biohazard Water Analysis Displayed at Water Security Congress
Early Warning today displayed its Biohazard Water Analyzer which offers the next generation in microbial testing. Using a unique combination of advanced technologies, the Analyzer goes beyond lab culturing of indicator coliforms and directly measures individual species of pathogenic bacteria, protozoa and viruses in the same test.
Posted: Apr 17th, 2009
Read moreGrace Announces Delivery of Advanced 0.18 Micron RFCMOS Process Design Kit
Grace Semiconductor Manufacturing Corporation, one of the leading semiconductor foundries in China, announced delivery of its advanced 0.18 micron RFCMOS process design kit through an exclusive 0.18 micron RFCMOS collaboration with Sentinel IC Technologies.
Posted: Apr 17th, 2009
Read moreAutomated System Measures and Analyzes Micro- and Nanofibers
The Fibermetric system from FEI delivers statistically valid data in minutes to improve fiber and filter material development and manufacturing.
Posted: Apr 17th, 2009
Read moreCover Story Features Enable IPC's Subsidiary, SolRayo
Enable IPC Corporation today announced that the cover story of the April 2009 edition of the American Ceramic Society Bulletin features Enable IPC's SolRayo subsidiary.
Posted: Apr 16th, 2009
Read moreAfter Name Change, Applied NanoWorks Is Now Auterra
Auterra, Inc. announced today it has completed the process of changing its name from Applied NanoWorks.
Posted: Apr 16th, 2009
Read moreNanosurf to Provide a Sneak Peek at the Successor to Their Famous easyPLL plus
Nanosurf today announced it will showcase the successor model to the world's best-selling Phase-Locked Loop (PLL) Detector and Controller at the NC-AFM Conference, September 2009, Yale, USA.
Posted: Apr 16th, 2009
Read moreSEMATECH and Canon ANELVA Partner to Develop Advanced Materials and Processes for Future Non-volatile Memory Devices
SEMATECH, a global consortium of chipmakers, announced today that Canon ANELVA Corporation, a leading manufacturer of semiconductor equipment, has joined its Front End Processes (FEP) Program.
Posted: Apr 16th, 2009
Read moreApplied Materials SunFab Line for Manufacturing Taiwan's Largest Solar Panels Certified by Green Energy Technologies
Green Energy Technology Inc., Ltd. (GET) has certified its SunFab Thin Film Line, supplied by Applied Materials, Inc., for the production of Taiwan?s largest solar photovoltaic panels.
Posted: Apr 16th, 2009
Read moreIBM Technology Alliance Announces Availability of Advanced 28-Nanometer Semiconductor Technology
In a move that signals a firm and ongoing commitment to advanced semiconductor technology leadership, IBM, Chartered Semiconductor Manufacturing Ltd., GLOBALFOUNDRIES, Infineon Technologies, Samsung Electronics, Co., Ltd., and STMicroelectronics have defined and are jointly developing a 28-nanometer (nm), high-k metal gate (HKMG), low-power bulk complementary metal oxide semiconductor (CMOS) process technology.
Posted: Apr 16th, 2009
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