Cover Story Features Enable IPC's Subsidiary, SolRayo
Enable IPC Corporation today announced that the cover story of the April 2009 edition of the American Ceramic Society Bulletin features Enable IPC's SolRayo subsidiary.
Apr 16th, 2009
Read more
Subscribe to our Nanotechnology Business News feed
After Name Change, Applied NanoWorks Is Now Auterra
Auterra, Inc. announced today it has completed the process of changing its name from Applied NanoWorks.
Apr 16th, 2009
Read moreNanosurf to Provide a Sneak Peek at the Successor to Their Famous easyPLL plus
Nanosurf today announced it will showcase the successor model to the world's best-selling Phase-Locked Loop (PLL) Detector and Controller at the NC-AFM Conference, September 2009, Yale, USA.
Apr 16th, 2009
Read moreSEMATECH and Canon ANELVA Partner to Develop Advanced Materials and Processes for Future Non-volatile Memory Devices
SEMATECH, a global consortium of chipmakers, announced today that Canon ANELVA Corporation, a leading manufacturer of semiconductor equipment, has joined its Front End Processes (FEP) Program.
Apr 16th, 2009
Read moreApplied Materials SunFab Line for Manufacturing Taiwan's Largest Solar Panels Certified by Green Energy Technologies
Green Energy Technology Inc., Ltd. (GET) has certified its SunFab Thin Film Line, supplied by Applied Materials, Inc., for the production of Taiwan?s largest solar photovoltaic panels.
Apr 16th, 2009
Read moreIBM Technology Alliance Announces Availability of Advanced 28-Nanometer Semiconductor Technology
In a move that signals a firm and ongoing commitment to advanced semiconductor technology leadership, IBM, Chartered Semiconductor Manufacturing Ltd., GLOBALFOUNDRIES, Infineon Technologies, Samsung Electronics, Co., Ltd., and STMicroelectronics have defined and are jointly developing a 28-nanometer (nm), high-k metal gate (HKMG), low-power bulk complementary metal oxide semiconductor (CMOS) process technology.
Apr 16th, 2009
Read moreASML Terminates Micronic Licences for Optical Maskless Lithography
Micronic Laser Systems AB and ASML Netherlands B.V. signed in December 2004 a license agreement giving ASML the right to market optical maskless lithography for semiconductor applications based on Micronic's patent portfolio in the SLM (Spatial Light Modulator) and data path technology. ASML has terminated its licenses.
Apr 16th, 2009
Read moreOxford Instruments Announces Multi-System Order From King Abdullah University of Science and Technology
This large order comprises multiple plasma etch, deposition and growth systems.
Apr 16th, 2009
Read moreReactive NanoTechnologies Develops Ruthenium Sputter Target Bonding Method
Reactive NanoTechnologies, Inc., developer and manufacturer of its patented NanoFoil, announced that it has developed a bonding solution using NanoBond for ruthenium sputtering targets bonded to metal backing plates that does not require the use of backside metallization.
Apr 15th, 2009
Read moreRUSNANO Board Approves Participation in Composite Materials Production Project
The Supervisory Council of Russian Corporation of Nanotechnologies has approved the Corporation's participation in the project aimed at organizing the industrial production of pre-pregs composed of carbon or mineral fibers impregnated with nano-filled bonding agent.
Apr 15th, 2009
Read moreZettaCore Launches Molecular Interface Technology
ZettaCore, Inc. today announced Molecular Interface technology. This nano treatment technology makes possible dramatic improvement in interconnect density without requiring expensive and often time-consuming introduction of new materials and processes.
Apr 15th, 2009
Read moreAsymtek Receives Service Excellence and New Product Innovation Awards at APEX 2009
Asymtek, a Nordson company and leader in dispensing, coating and jetting technologies, announces it has received two prestigious awards during APEX 2009.
Apr 15th, 2009
Read moreBreakthrough Nanoindentation Testing With Image Pattern Recognition
Nanovea has announced a breakthrough development in Nanoindentation testing by combining advanced image pattern recognition capabilities to the most advanced nano-indenter for quality control applications.
Apr 15th, 2009
Read moreTekmira Files Investigational New Drug Application for its Lead Candidate ApoB SNALP
Tekmira Pharmaceuticals Corporation announced it has filed an Investigational New Drug (IND) application seeking approval from the United States Food and Drug Administration to begin a Phase 1 human clinical trial to evaluate the Company's lead product candidate ApoB SNALP as a treatment for elevated low-density lipoprotein cholesterol.
Apr 15th, 2009
Read moreA123Systems Awarded $100 Million in Refundable Tax Credits from Michigan Economic Development Corporation
The refundable tax credits issued by the Michigan Economic Development Corporation (MEDC) will help implement A123?s existing strategy to establish Michigan as the manufacturing hub to meet demand from its growing global automotive customer portfolio.
Apr 14th, 2009
Read moreAgilent Technologies Enhances Performance of Popular Atomic Force Microscope for Research, Education
Agilent Technologies Inc. today announced the availability of a next-generation atomic force microscope (AFM) that can excel in both the laboratory and the classroom.
Apr 14th, 2009
Read more