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Asylum Research Introduces GetReal Automated Probe Calibration

With just one click, GetReal fully calibrates the atomic force microscope (AFM) probe sensitivity and spring constant, enabling more consistent, more accurate results. GetReal also protects the probe from damage that often occurs with conventional calibration methods, preserving the sharpest tip for the highest resolution imaging.

Posted: Aug 30th, 2013

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Picosun's ALD Technology Protects Coins

Picosun Oy reports breakthrough into coinage and minting market. This new application for Picosun's technology solidifies in the batch ALD tool Picosun provides to Austrian Mint, a European key minting customer, for industrial scale protective coating of coins.

Posted: Aug 30th, 2013

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Optimization of InGaAs Metamorphic Buffer For Laser Diodes Using EpiCurve TT

Temperature characteristics of laser diodes on GaAs substrate depend on the quality and the thermal resistance of InGaAs metamorphic buffer layer. At the Electronic Materials Symposium, NTT Photonics Laboratories presented a new method for optimization of the metamorphic buffer layer for freestanding quasi-InGaAs substrates.

Posted: Aug 29th, 2013

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Applied Chemical Laboratories Offers Chemical Purification Services to Remove Trace Ionic Contamination from Photovoltaic, Electronic and Nanotechnology Chemicals

pplied Chemical Laboratories, Inc., an innovator in high purity, eco-friendly electronic chemicals and specialized coatings now offers a custom service for removing contaminants from ultra-pure polymeric and organic chemicals and compounds. The service is tailored for lab scale development projects in the computer chip, photovoltaic, and pharmaceutical industries.

Posted: Aug 22nd, 2013

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NEI Corporation Introduces An Easy-to-Clean, Scratch Resistant Coating

NEI Corporation announced today that it has introduced a transparent, micron-thick coating that provides both scratch resistance and easy to clean properties to surfaces. The waterborne SR100EC coating can be applied to plastics such as polycarbonate, PMMA, PET, polyurethane, epoxy, as well as metals such as stainless steel, aluminum, titanium, brass and chrome.

Posted: Aug 20th, 2013

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Veeco Introduces GENxplor Molecular Beam Epitaxy System

Veeco Instruments Inc. today introduced the GENxplor Molecular Beam Epitaxy (MBE) Deposition System, the industry's first fully-integrated MBE system for the compound semiconductor R+D market. The GENxplor creates high quality epitaxial layers on substrates up to 3" in diameter and is ideal for cutting edge research on a wide variety of materials including GaAs, nitrides, and oxides.

Posted: Aug 19th, 2013

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