Selecta Biosciences, Inc., a privately held biopharmaceutical company developing immunomodulatory nanoparticles for the treatment and prevention of human diseases, announced today that it has secured a $15.1M Series B financing.
Nanogen, Inc., developer of molecular and rapid diagnostic products, announced today that it has expanded its partnership with HandyLab, Inc. by signing a licensing and supply agreement for use of the company?s proprietary Minor Groove Binder (MGB) Probe technology and synthetic nucleic acid chemistries, including dyes and quenchers, for use in in vitro diagnostic testing.
SEMATECH, a global consortium of the world's leading chip manufacturers, today announced that it has entered into a joint development partnership to accelerate mask blank commercialization with Asahi Glass Co., a commercial mask blank supplier in Japan.
Sidense, a leading developer of Logic Non-Volatile Memory IP cores, has announced that Sidense's one-time programmable memory was selected by Fujitsu Microelectronics Limited for use in ICs fabricated in its low-power 90nm silicon process.
Synopsys, Inc. , a world leader in software and IP for semiconductor design and manufacturing, today announced a joint collaboration with Powerchip and Nikon to deploy the Nikon Scanner Signature Files as a means to increase Proteus ProGen model accuracy on 42-nanometer flash memory designs.
BioNanomatrix, Inc., a developer of breakthrough whole genome imaging and analysis platforms for biomedical research, molecular diagnostics and personalized medicine, today announced that its low-cost nanofluidic genome analysis technology, along with founder and chief scientific officer Han Cao, has been included in Technology Review magazine?s 2009 list of 10 emerging technologies that will change the way we live and do business.
SEMATECH, a global consortium of chipmakers, announced today that it has signed a Letter of Intent with Tokyo Ohka Kogyo Co., Ltd., a leading manufacturer of photoresists, establishing the groundwork for a joint development agreement on collaborative efforts to optimize and develop new advanced imaging materials for extreme ultraviolet lithography.