For 22nm and beyond, patterning candidates such as EUVL, nano-imprint, direct write and optical double patterning methods show promise. But which one will deliver the best balance of performance and cost?
Applied Materials, Inc. today conducted a simulation of the 'carbon-free' transportation of the future at its Silicon Valley research campus, connecting battery-operated vehicles into the electrical grid utilizing energy generated by the company?s parking lot-based solar array.
Dr Neil Lewis, Technical Director for Malvern Instruments, will lead a two-hour interactive conferee networking session at this year?s Pittcon Conference and Expo in Chicago, and is seeking input from interested parties, whether or not they are able to attend in person.
Veeco Instruments Inc., a leading provider of atomic force microscopes (AFMs) to the nanoscience community, announced today that it will host the ?Seeing at the Nanoscale VII? conference at the University of California, Santa Barbara.
SanDisk Corporation and Toshiba Corporation today announced the co-development of multi-level cell (MLC) NAND flash memory using 32-nanometer (nm) process technology to produce a 32-gigabit (Gb) 3-bits-per-cell (X3) memory chip.
Veeco Instruments Inc. announced today that it received five Molecular Beam Epitaxy (MBE) systems orders during the fourth quarter of 2008, and over the past 12 months has seen an increase in orders for its multiple growth module cluster tool systems.
CombiMatrix Corporation announced today that preliminary data on its investigational Comprehensive Cancer Array test will be presented publicly for the first time, at Cambridge Healthtech Institute's 16th International Molecular Medicine Tri-Conference.