Applied Materials, Inc. today unveiled its Applied Centura Enabler E5 dielectric etch system, the industry?s most advanced solution for creating the 40:1 high aspect ratio contact features that are critical to the yield and performance of 32nm and below DRAM and Flash memory chips.
Agar Scientific is pleased to announce the immediate appointment of Steve Woodland as Managing Director with current MD, Dr Lynne Joyce moving to a new role as Director of Market Development where she will focus on technology, product development and customer relationships.
ConocoPhillips and the University of Kansas (KU) today announced a three-year collaborative nanotechnology research program which will focus on the development and testing of new technologies for oilfield stimulation to enhance recovery to help meet growing energy demand.
According to the World Fab Forecast report, recently released by SEMI, worldwide fab capacity is expected to grow by five percent in 2008 and is currently expected to increase between four and five percent in 2009.
Oxford Instruments Plasma Technology has announced that it has recently won an order from a leading manufacturer of HB-LEDs for three Plasmalab System133 ICP380 plasma etch tools for use in High Brightness LED (HB-LED) manufacturing.
The new Nanochemistry Laboratory is located at the Institut de Science et d?Ingenierie Supramoleculaires (ISIS) of the University of Strasbourg, France and will work closely with Strem?s U.S. facility. The goal of the new facility will be to serve R+D groups worldwide with custom-made nanostructured materials.
Applied Materials, Inc. today announced that it is leading a major effort to enable the widespread adoption of through-silicon vias, a rapidly-emerging approach for vertically stacking integrated circuits to boost chip performance and functionality in a smaller area.