CVD Equipment Corporation announced a new order quarterly booking record for the three month period ending September 30, 2008 of $5.9 million. This represents an increase of 16% over the same period in 2007 and a 20% increase over the previous quarter.
SUSS MicroTec, supplier of innovative solutions for 3D Integration (3DI), MEMS, Advanced Packaging and Nanotechnology markets, launches the third generation of its MA/BA8, a manual mask and bond aligner that offers highest process flexibility including submicron alignment and exposure optics dedicated for thick resist exposure.
After formal closing of its recent acquisition of Karmiel (Israel) based Pixer Technology Ltd., Carl Zeiss SMT's Semiconductor Metrology Systems division (SMS) presents its market-leading suite of closed-loop product solutions at Semicon Europa (Stuttgart, Germany) and SPIE/BACUS Photomask Symposium (Monterey, CA).
Syntec Optics, recipient of the prestigious 2008 Frost and Sullivan Growth Excellence Award in the North American polymer optics market, announces new manufacturing capacity that directly correlates with its focus on innovation.
Enable IPC Corp., a leading company for turning technologies into products and successfully bringing them to market, today announced that it has acquired a controlling interest in SolRayo LLC, an established Wisconsin technology company that develops ultracapacitor technology for improving the storage, delivery and usage of energy.
Zecotek Photonics Inc. today announced that the Canadian Patent Office has issued Notice of Allowance to Zecotek Imaging Systems Singapore Pte. Ltd., a wholly-owned subsidiary, for its LFS scintillation material.
BASF Catalysts, a global leader in catalysis, will introduce the first two catalysts from its new NanoSelect platform technology, NanoSelect LF 100 and NanoSelect LF 200, for use in fine chemical and pharmaceutical applications at the CPhl Worldwide which starts today.
CombiMatrix Corporation announced today the launch of two new array-based diagnostic tests, adding to its leading and growing portfolio of tests. These new tests augment each other and demonstrate levels of multiplexing and personalization that are unprecedented in the industry.
ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm).
Superlattice Power, Inc., a company involved in the development and marketing of next generation of lithium-powered batteries, along with all its current developments, is working towards partnering with a major U.S. company to achieve advanced development of lithium ion battery technology with a partially lithiated anode and cathode technology.
Micronics, Inc. today announced that it has been issued two patents from the United States Patent and Trademark Office (USPTO) for novel microfluidic devices and methods. These new patents relate to the company?s focus on the development of rapid and easy to use clinical diagnostic products.
Researchers in India have been investigating the nano tensile properties of human hair using an LFPlus single column materials testing machine and NEXYGENPlus control and analysis software from Lloyd Instruments.