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SUSS MicroTec Launches Next-Generation Manual Mask and Bond Aligner

SUSS MicroTec, supplier of innovative solutions for 3D Integration (3DI), MEMS, Advanced Packaging and Nanotechnology markets, launches the third generation of its MA/BA8, a manual mask and bond aligner that offers highest process flexibility including submicron alignment and exposure optics dedicated for thick resist exposure.

Posted: Oct 1st, 2008

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Carl Zeiss Formally Closes Acquisition of Pixer Technology

After formal closing of its recent acquisition of Karmiel (Israel) based Pixer Technology Ltd., Carl Zeiss SMT's Semiconductor Metrology Systems division (SMS) presents its market-leading suite of closed-loop product solutions at Semicon Europa (Stuttgart, Germany) and SPIE/BACUS Photomask Symposium (Monterey, CA).

Posted: Oct 1st, 2008

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BASF Introduces New NanoSelect Catalysts for Pharma Applications

BASF Catalysts, a global leader in catalysis, will introduce the first two catalysts from its new NanoSelect platform technology, NanoSelect LF 100 and NanoSelect LF 200, for use in fine chemical and pharmaceutical applications at the CPhl Worldwide which starts today.

Posted: Sep 30th, 2008

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ASML Reveals EUV Lithography Roadmap to 11 Nanometers and Beyond

ASML Holding NV (ASML) presents today at the 2008 International Symposium on Extreme Ultraviolet Lithography (EUV) on recent achievements in its EUV lithography program and unveils a production system roadmap that supports cost-effective chip manufacturing to at least 11 nanometers (nm).

Posted: Sep 30th, 2008

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