Molecular Imprints, Inc. (MII) today introduced the latest addition to its family of imprint lithography tools for semiconductor applications‚??the Imprio 300. Incorporating improvements in automation, tool throughput and overlay performance, the Imprio 300 represents the industry‚??s highest resolution and lowest cost-of-ownership (CoO) patterning solution for IC prototyping and process development at the 32nm node and beyond.
The Catena Group has benefitted in 2007 from the continued rising worldwide demand for wireless applications. Invoiced turnover is expected to have grown with regard to 2006 with 37% from 18.9 Million Euros to 26 Million Euros in 2007. The profit of the entire group is expected to rise with more than 50%.
BioAlliance Pharma SA confirmed that it will pursue its advanced compound acquisition strategy for European oncology and HIV markets, despite Immtech Pharmaceuticals Inc.'s recently announced discontinuation of its pafuramidine program.
Holmenkol, Germany and Nanovations Pty Ltd in Australia cooperate world-wide to distribute and develop innovative products for the use in sport and boating performance coatings and the yacht maintenance market.
EV Group, a leading supplier of manufacturing equipment for the advanced packaging/3D interconnect, MEMS, SOI, nanotechnology, compound semiconductor and silicon-based power devices markets, today announced that it has received a multiple system order from Colibrys, a world-leading supplier of standard and custom MEMS-based motion sensors for harsh-environment and safety critical applications.
Michele Ostraat, Ph.D., recently joined RTI International as director of engineering research for the Center for Aerosol Technology. In that role she will manage 25 staff members who conduct a wide range of research on aerosol technology and nanotechnology platforms.
Engineers from SEMATECH and the International SEMATECH Manufacturing Initiative (ISMI) will deliver more than 30 papers and posters during the SPIE Advanced Lithography conferences next week in San Jose, CA, with an overriding emphasis on the manufacturability of current and emerging technology options to take the industry to 32nm half-pitch and beyond - including extreme ultraviolet (EUV) lithography, 193nm optical lithography extensions, and related areas of metrology, inspection, and process control.
With 32nm technologies ramping within the next two years, implementing production-worthy techniques to address advanced patterning requirements becomes device makers' primary concern. On February 27th Applied Materials, Inc. will host a full day of technical presentations to discuss strategies and solutions to meet these scaling challenges.
NaturalNano, Inc., a developer of advanced nanomaterials and controlled release nanotechnologies, announced the Company's performance goals for fiscal year 2008. Currently, several strategic alliances are in negotiation and product evaluation, which are expected to close during the first half of 2008.
Nanometrics Incorporated, a leading supplier of advanced metrology equipment to the semiconductor industry, today announced its financial results for the fourth quarter and full year ended December 29, 2007.
Copper theft is a community problem that is continuing to grow. Thieves have stolen air conditioners out of churches, equipment of out schools and wiring out of streetlights. Oncor, with its miles of distribution and transmission lines, is also a target for these thieves.