These modules include the latest MII proprietary Jet and Flash Imprint Lithography technology which delivers the performance required for high volume manufacturing of advanced semiconductor memory devices.
International team of scientists will research into carbon-based materials for use in energy storage systems and electronic applications. Investment in Carbon Materials Innovation Center adds up to 10 million euros.
At this week's European Photovoltaic Solar Energy Conference and Exhibition, imec, RENA and SoLayTec present thin, large area i-PERC-type Silicon solar cells with atomic layer deposition passivation achieving a cell efficiency of 19.6% without selective emitter using an industrial screen printing process flow.
NT-MDT participated in the Joint International ISFD-11th-RCBJSF symposium combining 11th International Symposium on Ferroic Domains and Micro- to Nanoscopic Structures (ISFD-11), and 11th Russia/CIS/Baltic/Japan Symposium on Ferroelectricity (RCBJSF-11) simultaneously with International Youth Conference "High resolution microscopy" that all were held in the Ural Federal University in Russia.
Applied Nanotech Holdings, Inc. announced today that it has been awarded a Phase II Small Business Innovation Research (SBIR) grant, in the amount of $999,990, from the U.S. Department of Energy to develop ultra lightweight hydrogen fuel tanks using carbon nanotube reinforcement.
At the 19th International Mass Spectrometry Conference, Bruker today introduced the breakthrough new solariX XR Fourier Transform Mass Spectrometer (FTMS) with the revolutionary ParaCell for extreme mass resolution greater than 10 million.
Digital Surf announced a new generation of Mountains 7 software that is compatible with scanning electron microscopes and multi-spectral (Raman) instruments and also brings numerous new features and enhancements for all other supported instrument families.
Veeco Instruments Inc. announced today that SEMATECH, a global semiconductor consortium that conducts research and development to advance chip manufacturing, has recently achieved a major breakthrough using Veeco's NEXUS Low Defect Density Ion Beam Deposition (LDD IBD) System to significantly reduce defects from multi-layer deposition of mask blanks used for extreme ultraviolet lithography (EUVL).