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EUVL Symposium hears about progress in resist and mask areas

SEMATECH engineers and the industry at large have made significant advances in moving forward the infrastructure that will prepare extreme ultraviolet lithography (EUVL) for cost-effective manufacturing, according to papers presented at the 2008 International EUVL Symposium in Lake Tahoe, California.

Posted: Oct 14th, 2008

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Nanobubbles to reduce flow resistance in liquids

Scientists are puzzled by the nanobubbles that can develop on surfaces under water. It should be impossible for them to exist but nevertheless they remain intact for hours. They are something of a mystery, yet it is possible to manipulate the development of these bubbles.

Posted: Oct 14th, 2008

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