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Higher-quality coatings through 'runaway' self-sputtering

Scientists at the U.S. Department of Energy's Lawrence Berkeley National Laboratory have now developed a powerful new kind of sputter process that can deposit high-quality metal films in complex, three-dimensional nanoscale patterns at a rate that by one important measure is orders of magnitude greater than typical systems

Posted: Jan 29th, 2009

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Conducting domain walls could be the ultimate feature for future nanoelectronics

The logic and memory functions of future electronic devices could shrink dramatically - to one or two nanometers instead of the many tens of nanometers that characterize today?s most advanced elements - if a way can be found to control domain walls, the ultrathin transition zones that separate regions of a material having different magnetic, electric, or other properties.

Posted: Jan 28th, 2009

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Nanotechnology fine print

Stanford researchers have reclaimed bragging rights for creating the world's smallest writing, a distinction the university first gained in 1985 and lost in 1990.

Posted: Jan 28th, 2009

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