PMMA & P(MMA-MAA) Co-polymer
- Price:
- Request a Quote
- Vendor:
- EM Resist Ltd
- Country:
- United Kingdom | Contact Details
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PMMA Resist is the industry standard electron beam resist used across academia and industry for high resolution features and lift-off applications. PMMA resist can also be used in nanoimprint applications as well as other fab and R&D processes such as graphene flake transfer.
If you have any application specific questions please don’t hesitate to contact us.
Multiple molecular weights available, from 35K to 950K.
Dilutions in anisole: A2 - A14
We also provide P(MMA-MAA) co-polymer in ethyl lactate.
We provide this industry standard product at the cheapest rates without compromising on quality and have various flexible distribution methods to meet multi users demand.
We distribute worldwide via a network of agents. If you wish to know more please visit www.emresist.com or contact our sales/application team at [email protected] -
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EM Resist Ltd. is specialised in developing materials used for lithography and nanofabrication applications. With over 20 years combined experience, we are continually developing the next generation of materials that will enable you to push forward in your research and development.
Can we help you?
Do you have a specific application or problem that you are trying to solve? Are conventional tools or materials not working for you? Let us know and we may be able to help. With our deep in house knowledge on electron beam lithography and close connection with our sister companies EM Analytical & EM Systems Support, we can help you design materials and tools specific for your application.
We have a full suite of nanofabrication tools that are available for one-off project work or complete proof of principle projects.
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