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  • SiOx Photoresist
  • SiOx Photoresist

SiOx Photoresist

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Request the latest price from Applied Quantum Materials Inc.

  • David Antoniuk,Applied Quantum Materials Inc.
  • SiOx Photoresist
  •  
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Contact Details

  • Applied Quantum Materials Inc.
  • David Antoniuk
  • 4-152 Centennial Centre for Interdisciplinary Sciences
  • Edmonton
  • Alberta
  • Canada
  • 1 (780) 554-7398
  • http://www.aqmaterials.com
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Contact Supplier

  • David Antoniuk,Applied Quantum Materials Inc.
  •  

  • SiOx is a high purity, silsesquioxane-based semiconductor grade polymer applicable as a negative tone resist for electron beam patterns, EUV, nanoimprint lithography and Step and Flash Imprint Lithography (SFIL). It is readily soluble in non-polar organic solvents like methyl isobutylketone (MIBK), methyl siloxane and toluene for thin-film fabrication. Depending on the film thickness, a dense pattern with sub-10 nm half-pitch can be achieved.

  • AQM is a world leader in the research, development and synthesis of metal-free, non-toxic, biocompatible silicon quantum dots and semiconductor nanostructures for a broad range of applications in sensing, energy, displays, security and bio-imaging.
    AQM also sells Polymeric SiOx e-beam resist for semiconductor fabrication with linewidth resolution of <10 nm.
    Visit company website

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