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Posted: May 26, 2009
Vistec Lithography Presents the Latest Version of its EBPG Product Line
(Nanowerk News) Vistec's EBPG5200 features the most advanced electron beam lithography
technology for exposure of substrates – from small fragments to complete
The EBPG5200 - Evolution rather than Revolution
The Vistec EBPG5200 represents the continued development stage of the
successful EBPG product series. With added improvements in resolution, noise
reduction, and stability, the Vistec EBPG5200 is even better adapted to the
diverse and ever increasing nanotechnology requirements of science and
research at universities, academic and industry-related research centers.
The Vistec EBPG5200 enables users to address a multitude of application
fields, such as nanotechnology, biotechnology, integrated optics, security,
semiconductor research, X-ray optics, MEMS and sensor engineering to name
but a few of them. Vistec EBPG5200 system users benefit from more than
thirty years of experience that Vistec has gained in the electron beam
lithography business. This is clearly demonstrated by a large established
base of EBPG systems currently installed worldwide.
Safe Investment for the Future
A "modular" concept for functional features and user needs is the heart of
the EBPG5200 scheme. The Vistec EBPG5200ES (Entry System) is the
cost-efficient basic version of the EBPG5200 series. Upgrading to the full
EBPG5200 functionality may be performed at any time, depending on the user’s
available budget and application requirements.
This highly flexible concept facilitates adaptation to the latest
requirements and future application needs while offering various retrofit
modules that are affordably priced.
The Vistec EBPG5200 is equipped with a modified platform that supports full
exposure of substrates to a maximum size of 200mm. Like the previous EBPG
tools, it can be used to expose fragments and special substrates in addition
to standard substrate types and sizes. Essential design principles of the
previous EBPG systems have been incorporated into this new 200mm platform.
Leading Edge Lithography
With further enhancements in resolution, noise reduction and beam stability,
the Vistec EBPG5200 is set to generate structures to less than 8nm on
substrates of any size and type. Its electron-optical column (TFE source) is
rated for acceleration voltages of 20, 50, and 100kV. With the EBPG5200
Vistec offers true 100kV / 1mm performance under regu¬lar electron-optical
conditions. However, what makes Vistec’s electron beam lithography of
superior standards actually possible is the perfect match of the various
system components such as the electron-optical column, the hardware
platform, the data processor and the exposure engine working together in a
flexible and user friendly system. One example, how this relates to practice
is the structuring of fine gates and coarser connector pads in transistor
arrays. By splitting the job into a coarse and fine writing strategy,
throughput can be maximized. Such sub-50nm gates can be structured to run at
optimum exposure current and the coarser pads exposed with a useful beam
current greater than 100nA and a maximum deflection rate of 50MHz in an
automatic exposure cycle. Switching between ultra-high resolution and
throughput occurs on a floating basis and is fully automated. No manual
intervention is required, whether at the electron-optical column or in terms
of program sequence.
Simple Operation – Highest Fexibility
The system incorporates an interactive graphical user interface (GUI) that
provides the ease of use for diverse "multi user environments", as often
required in the case of large user teams. The EBPG5200 has a proven and
reliable load-lock. With a maximum holding capacity of ten equal or
different substrate holders, the load-lock can accomodate a variety of
substrate sizes and types as necessary for the particular application task.
With this highly automated operation mode, users may also tailor the
exposure sequencing to their specific requirements. Furthermore, the system
includes LINUX based operational software and the user may choose his
preferred data preparation scheme.
The EBPG5200 – The System of Choice for Electron Beam Nanolithography
The EBPG5200 represents a high performance electron beam lithography
patterning system for today’s and future nanotechnology requirements. With
its evolutionary design, advanced lithography specification, performance and
software, as well as with its substrate flexibility, compact footprint, and
excellent global service support, the EBPG5200 is the system of choice for
all current and future nanotechnology applications.