Posted: August 17, 2009

Vistec Electron Beam Lithography Group at ChinaNano 2009

(Nanowerk News) The Vistec Electron Beam Lithography Group will be present at the ChinaNano 2009. This international conference and exhibition, focusing on research in Nanoscience and Nanotechnology, will take place in the Beijing International Convention Center from September 1-3, 2009.
At Booth 11, Vistec is going to present both Vistec as a company as well as their latest technologies including the recently launched Vistec EBPG5200. A Vistec representative is looking forward to explaining you their products and answering your questions. In order to guarantee sufficient time for each person, Vistec would like to schedule individual appointments. Therefore please confirm your coming via email to [email protected]
Furthermore Vistec would like you to take notice of the following event:
Dr. Hans C. Pfeiffer, IBM Fellow Emeritus, Consulting Services, Monterey, CA will speak about "New electron-beam concepts as tools for nanofabrication" in Session 5-2 "Fabrications of Nanostructure and Nanodevice (II)" on Tuesday September 1st, 2009.
Until 2002, Dr. Pfeiffer was working for the IBM Corporation. During his 34-year career he established a world class team and played a leading role in the development of IBM's state-of-the-art E-Beam lithography systems. He is recognized for building the industry's first Shaped Beam lithography systems. Don’t miss Dr. Pfeiffer’s presentation!
Source: Vistec (press release)
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