Posted: August 20, 2009

Nanometrics Receives Order for Multiple Atlas XP Metrology Systems Equipped with NanoCD Capability

(Nanowerk News) Nanometrics Incorporated, a leading supplier of advanced process control metrology systems used primarily in the manufacturing of semiconductors, solar photovoltaics and high-brightness LEDs as well as advanced wafer-scale packaging, today announced that is has received an order for multiple Atlas XP metrology systems equipped with NanoCD™ capability. The systems are expected to be qualified in the third quarter of this year at a leading semiconductor manufacturer. The systems will be installed with Nanometrics’ scalable NanoGen cluster computing solutions to enable analysis of the most critical and complex process steps in an advanced technology node, supporting both film thickness and optical critical dimension (OCD) metrology.
“The challenges of leading edge semiconductor manufacturing methods have pushed many conventional technologies aside and require that the measurement of thin film thickness, profiles and device geometries occur directly on complex structures,” commented Bill McGahan, Director of OCD Technology Development at Nanometrics. “Additionally, the rapidly changing process environment necessitates a system and software solution to support robust recipe development. By combining the full NanoCD suite, including our NanoDiffract™ software, NanoGen cluster computing solutions and Atlas XP metrology systems, our customer has a path to accurate and precise process monitoring in a dynamic and rapidly evolving development line.”
With this deployment, Nanometrics now has OCD solutions in every segment of the fab including lithography, etch, chemical mechanical polishing (CMP) and thin film deposition, and across all device types including logic, DRAM, flash memory, and magnetic heads spanning the 65nm to 22nm nodes.
About Nanometrics
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used primarily in the manufacturing of semiconductors, advanced wafer-scale packaging, solar photovoltaics and high-brightness LEDs, as well as by customers in the silicon wafer and data storage industries. Nanometrics standalone and integrated metrology systems measure various thin film properties, critical dimensions, overlay control, topography, and optical, electrical and material properties, including the structural composition of silicon, compound semiconductor and photovoltaic devices, during various steps of the manufacturing process, from front end of line substrate manufacturing through die preparation for advanced packaging. These systems enable device manufacturers to improve yields, increase productivity and lower their manufacturing costs. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide.
Source: Nanometrics (press release)
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